The Resource 15th Annual Symposium on Photomask Technology and Management : proceedings : 20-22 September, 1995, Santa Clara, California, Gilbert V. Sheldon, James N. Wiley, chairs/editors; sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology, published by SPIE--The International society for Optical Engineering, (electronic book)

15th Annual Symposium on Photomask Technology and Management : proceedings : 20-22 September, 1995, Santa Clara, California, Gilbert V. Sheldon, James N. Wiley, chairs/editors; sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology, published by SPIE--The International society for Optical Engineering, (electronic book)

Label
15th Annual Symposium on Photomask Technology and Management : proceedings : 20-22 September, 1995, Santa Clara, California
Title
15th Annual Symposium on Photomask Technology and Management
Title remainder
proceedings : 20-22 September, 1995, Santa Clara, California
Statement of responsibility
Gilbert V. Sheldon, James N. Wiley, chairs/editors; sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology, published by SPIE--The International society for Optical Engineering
Creator
Contributor
Subject
Genre
Language
eng
Member of
Cataloging source
SPIED
Illustrations
illustrations
Index
index present
Literary form
non fiction
http://bibfra.me/vocab/lite/meetingDate
1995
http://bibfra.me/vocab/lite/meetingName
Symposium on Photomask Technology and Management
Nature of contents
  • dictionaries
  • bibliography
http://library.link/vocab/relatedWorkOrContributorName
  • Sheldon, Gilbert V
  • Wiley, James N
  • BACUS (Technical group)
  • Society of Photo-optical Instrumentation Engineers
  • SPIE Digital Library
Series statement
SPIE proceedings series,
Series volume
2621
http://library.link/vocab/subjectName
  • Integrated circuits
  • Microlithography
Label
15th Annual Symposium on Photomask Technology and Management : proceedings : 20-22 September, 1995, Santa Clara, California, Gilbert V. Sheldon, James N. Wiley, chairs/editors; sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology, published by SPIE--The International society for Optical Engineering, (electronic book)
Instantiates
Publication
Bibliography note
Includes bibliographical references and author index
Dimensions
28 cm.
Dimensions
unknown
Extent
ix, 636 p.
Form of item
electronic
Other physical details
ill.
Reproduction note
Electronic resource.
Specific material designation
remote
Label
15th Annual Symposium on Photomask Technology and Management : proceedings : 20-22 September, 1995, Santa Clara, California, Gilbert V. Sheldon, James N. Wiley, chairs/editors; sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology, published by SPIE--The International society for Optical Engineering, (electronic book)
Publication
Bibliography note
Includes bibliographical references and author index
Dimensions
28 cm.
Dimensions
unknown
Extent
ix, 636 p.
Form of item
electronic
Other physical details
ill.
Reproduction note
Electronic resource.
Specific material designation
remote

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