The Resource 19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California, Frank E. Abboud, Brian J. Grenon, chairs/editors ; sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology, (electronic book)

19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California, Frank E. Abboud, Brian J. Grenon, chairs/editors ; sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology, (electronic book)

Label
19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California
Title
19th Annual Symposium on Photomask Technology
Title remainder
15-17 September 1999, Monterey, California
Statement of responsibility
Frank E. Abboud, Brian J. Grenon, chairs/editors ; sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology
Title variation
  • Nineteenth Annual Symposium on Photomask Technology
  • Symposium on Photomask Technology
  • Photomask technology
Creator
Contributor
Subject
Genre
Language
eng
Member of
Cataloging source
SPIED
Illustrations
illustrations
Index
index present
Literary form
non fiction
http://bibfra.me/vocab/lite/meetingDate
1999
http://bibfra.me/vocab/lite/meetingName
Symposium on Photomask Technology
Nature of contents
  • dictionaries
  • bibliography
http://library.link/vocab/relatedWorkOrContributorName
  • Abboud, Frank E
  • Grenon, Brian J
  • BACUS (Technical group)
  • Society of Photo-optical Instrumentation Engineers
  • SPIE Digital Library
Series statement
SPIE proceedings series
Series volume
3873
http://library.link/vocab/subjectName
  • Integrated circuits
  • Microlithography
Label
19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California, Frank E. Abboud, Brian J. Grenon, chairs/editors ; sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology, (electronic book)
Instantiates
Publication
Note
Eighteenth conference called: Symposium on Photomask Technology and Management
Bibliography note
Includes bibliographical references and index
Dimensions
28 cm.
Dimensions
unknown
Extent
2 v. (xv, 1022 p.)
Form of item
electronic
Other physical details
ill. (some col.)
Reproduction note
Electronic resource.
Specific material designation
remote
Label
19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California, Frank E. Abboud, Brian J. Grenon, chairs/editors ; sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology, (electronic book)
Publication
Note
Eighteenth conference called: Symposium on Photomask Technology and Management
Bibliography note
Includes bibliographical references and index
Dimensions
28 cm.
Dimensions
unknown
Extent
2 v. (xv, 1022 p.)
Form of item
electronic
Other physical details
ill. (some col.)
Reproduction note
Electronic resource.
Specific material designation
remote

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