Coverart for item
The Resource 25th European Mask and Lithography Conference : 12-15 January 2009, Dresden, Germany : [proceedings], Uwe F.W. Behringer, editor ; organized by VDE/VDI GMM--the Society for Microelectronics, Micro- and Precision Engineering (Germany) ; cooperating organizations, BACUS [and others]

25th European Mask and Lithography Conference : 12-15 January 2009, Dresden, Germany : [proceedings], Uwe F.W. Behringer, editor ; organized by VDE/VDI GMM--the Society for Microelectronics, Micro- and Precision Engineering (Germany) ; cooperating organizations, BACUS [and others]

Label
25th European Mask and Lithography Conference : 12-15 January 2009, Dresden, Germany : [proceedings]
Title
25th European Mask and Lithography Conference
Title remainder
12-15 January 2009, Dresden, Germany : [proceedings]
Statement of responsibility
Uwe F.W. Behringer, editor ; organized by VDE/VDI GMM--the Society for Microelectronics, Micro- and Precision Engineering (Germany) ; cooperating organizations, BACUS [and others]
Title variation
  • European Mask and Lithography Conference 2009
  • EMLC 2009
Creator
Contributor
Subject
Genre
Language
eng
Member of
Cataloging source
NHM
Dewey number
621.3815
Illustrations
illustrations
Index
no index present
LC call number
TK7872.M3
LC item number
E97 2009e
Literary form
non fiction
http://bibfra.me/vocab/lite/meetingDate
2009
http://bibfra.me/vocab/lite/meetingName
European Mask and Lithography Conference
Nature of contents
  • dictionaries
  • bibliography
http://library.link/vocab/relatedWorkOrContributorName
  • Behringer, Uwe F. W.
  • SPIE (Society)
Series statement
Proceedings of SPIE,
Series volume
v. 7470
http://library.link/vocab/subjectName
  • Integrated circuits
  • Microlithography
Label
25th European Mask and Lithography Conference : 12-15 January 2009, Dresden, Germany : [proceedings], Uwe F.W. Behringer, editor ; organized by VDE/VDI GMM--the Society for Microelectronics, Micro- and Precision Engineering (Germany) ; cooperating organizations, BACUS [and others]
Instantiates
Publication
Note
Title from PDF title (SPIE digital library, viewed June 23, 2009)
Antecedent source
unknown
Bibliography note
Includes bibliographical references
Carrier category
online resource
Carrier category code
cr
Carrier MARC source
rdacarrier
Color
multicolored
Content category
text
Content type code
txt
Content type MARC source
rdacontent
Contents
Lithography development and research challenges for the d"2nm half-pitch / Stefan Wurm -- Mask industry assessment trend analysis / Greg Hughes and Henry Yun -- Mask salvage in the age of capital contraction / Kurt R. Kimmel -- SEMATECH mask program / Henry Yun [and others] -- Mask parameter variation in the context of the overall variation budget of an advanced logic wafer fab / Rolf Seltmann [and others] -- Extended Abbe approach for fast and accurate lithography imaging simulations / P. Evanschitzky, A. Erdmann, and T. Fühner -- Decomposition algorithm for double patterning of contacts and via layers / A. El-Gamal and M. Al-lmam -- Mask contribution on CD and OVL errors budgets for double patterning lithography / I. Servin [and others] -- New methods and processes based on advanced vacuum technology for photomask decontamination / J.M. Foray [and others] -- Particle transport and reattachment on a mask surface / Pavel Nesladek, Steve Osborne, and Christian Kohl -- Contamination control for ArF photo masks / Joseph S. Gordon [and others] -- Lithography light source challenges for double patterning and EUVL / Nigel R. Farrar [and others] -- The task of EUV reflectometry for HVM of EUV masks: first steps / Azadeh Farahzadi, Christian Wies, and Rainer Lebert -- EUV and DUV scatterometry for CD and edge profile metrology on EUV masks / Bernd Bodermann [and others] -- EUV imaging performance: moving towards production / Eelco van Setten [and others] -- Resolution capability of EBM-6000 and EBM-7000 for nano-imprint template / S. Yoshitake and T. Kamikubo -- Electron beam inspection methods for imprint lithography at 32 nm / Kosta Selinidis [and others] -- UV NIL template making and imprint evaluation / Shiho Sasaki [and others] -- Residual-free imprint for sensor definition / A. Mayer [and others] -- Monte Carlo simulations of image analysis for flexible and high-resolution registration metrology / M. Arnz [and others] -- SEM image contrast modeling for mask and wafer metrology / C.G. Frase [and others] -- Registration metrology on double patterning reticles / Karl-Heinrich Schmidt [and others] -- Reduced pellicle impact on overlay using high order intrafield grid corrections / Robert de Kruif, Tasja van Rhee, and Eddy van der Heijden -- High resolution cell projection / U. Weidenmueller [and others] -- Mapper: high throughput maskless lithography / V. Kuiper [and others] -- New writing strategy in electron beam direct write lithography to improve critical dense lines patterning for sub-45nm nodes / L. Martin [and others] -- A solution to meet new challenges on EBDW data prep / R. Galler [and others] -- Improving yield and cycle time at the inspection process by means of a new defects disposition technique / Ernesto Villa [and others] -- Nuisance event reduction using sensitivity control layers (SCL) for advanced photomask inspection / Shad Hedges [and others] -- Increasing inspection equipment productivity by utilizing factory automation SW on TeraScan 5XX systems / Thomas Jakubski [and others] -- Error-budget paradigms and laser mask pattern generator evolution / H. Christopher Hamaker, Matthew J. Jolley, and Andrew D. Berwick -- Ion beam deposition for defect-free EUVL mask blanks / Patrick Kearney [and others] -- EUV actinic defect inspection and defect printability at the sub-32-nm half-pitch / Sungmin Huh [and others] -- Sub-30-nm defect removal on EUV substrates / Abbas Rastegar [and others] -- Innovative processes investigation for photomask pod conditioning and drying / J.M. Foray [and others] -- High speed (>100 Gbps) key components for a scalable optical data link to be implemented in future maskless lithography applications / A. Paraskevopoulos [and others] -- Molecular dynamics study on mold fracture by nanoscale defects in nanoimprint lithography / K. Tada [and others] -- Advanced proximity matching with pattern matcher / Alexander Serebryakov [and others] -- Mounting methodologies to measure EUV reticle nonflatness / Venkata Siva Battula [and others] -- CDP: application of focus drilling / S. Geisler [and others] -- MeRiT repair verification using in-die phase metrology Phame / Ute Buttgereit, Robert Birkner, and Robert Stelzner -- Design verification for sub-70-nm DRAM nodes via metal fix using E-beam direct write / K. Keil [and others]
Dimensions
unknown
Extent
1 online resource
File format
unknown
Form of item
online
Isbn
9780819477705
Lccn
2010459382
Level of compression
unknown
Media category
computer
Media MARC source
rdamedia
Media type code
c
Other physical details
illustrations (some color).
Quality assurance targets
unknown
Reformatting quality
unknown
Sound
unknown sound
Specific material designation
remote
Label
25th European Mask and Lithography Conference : 12-15 January 2009, Dresden, Germany : [proceedings], Uwe F.W. Behringer, editor ; organized by VDE/VDI GMM--the Society for Microelectronics, Micro- and Precision Engineering (Germany) ; cooperating organizations, BACUS [and others]
Publication
Note
Title from PDF title (SPIE digital library, viewed June 23, 2009)
Antecedent source
unknown
Bibliography note
Includes bibliographical references
Carrier category
online resource
Carrier category code
cr
Carrier MARC source
rdacarrier
Color
multicolored
Content category
text
Content type code
txt
Content type MARC source
rdacontent
Contents
Lithography development and research challenges for the d"2nm half-pitch / Stefan Wurm -- Mask industry assessment trend analysis / Greg Hughes and Henry Yun -- Mask salvage in the age of capital contraction / Kurt R. Kimmel -- SEMATECH mask program / Henry Yun [and others] -- Mask parameter variation in the context of the overall variation budget of an advanced logic wafer fab / Rolf Seltmann [and others] -- Extended Abbe approach for fast and accurate lithography imaging simulations / P. Evanschitzky, A. Erdmann, and T. Fühner -- Decomposition algorithm for double patterning of contacts and via layers / A. El-Gamal and M. Al-lmam -- Mask contribution on CD and OVL errors budgets for double patterning lithography / I. Servin [and others] -- New methods and processes based on advanced vacuum technology for photomask decontamination / J.M. Foray [and others] -- Particle transport and reattachment on a mask surface / Pavel Nesladek, Steve Osborne, and Christian Kohl -- Contamination control for ArF photo masks / Joseph S. Gordon [and others] -- Lithography light source challenges for double patterning and EUVL / Nigel R. Farrar [and others] -- The task of EUV reflectometry for HVM of EUV masks: first steps / Azadeh Farahzadi, Christian Wies, and Rainer Lebert -- EUV and DUV scatterometry for CD and edge profile metrology on EUV masks / Bernd Bodermann [and others] -- EUV imaging performance: moving towards production / Eelco van Setten [and others] -- Resolution capability of EBM-6000 and EBM-7000 for nano-imprint template / S. Yoshitake and T. Kamikubo -- Electron beam inspection methods for imprint lithography at 32 nm / Kosta Selinidis [and others] -- UV NIL template making and imprint evaluation / Shiho Sasaki [and others] -- Residual-free imprint for sensor definition / A. Mayer [and others] -- Monte Carlo simulations of image analysis for flexible and high-resolution registration metrology / M. Arnz [and others] -- SEM image contrast modeling for mask and wafer metrology / C.G. Frase [and others] -- Registration metrology on double patterning reticles / Karl-Heinrich Schmidt [and others] -- Reduced pellicle impact on overlay using high order intrafield grid corrections / Robert de Kruif, Tasja van Rhee, and Eddy van der Heijden -- High resolution cell projection / U. Weidenmueller [and others] -- Mapper: high throughput maskless lithography / V. Kuiper [and others] -- New writing strategy in electron beam direct write lithography to improve critical dense lines patterning for sub-45nm nodes / L. Martin [and others] -- A solution to meet new challenges on EBDW data prep / R. Galler [and others] -- Improving yield and cycle time at the inspection process by means of a new defects disposition technique / Ernesto Villa [and others] -- Nuisance event reduction using sensitivity control layers (SCL) for advanced photomask inspection / Shad Hedges [and others] -- Increasing inspection equipment productivity by utilizing factory automation SW on TeraScan 5XX systems / Thomas Jakubski [and others] -- Error-budget paradigms and laser mask pattern generator evolution / H. Christopher Hamaker, Matthew J. Jolley, and Andrew D. Berwick -- Ion beam deposition for defect-free EUVL mask blanks / Patrick Kearney [and others] -- EUV actinic defect inspection and defect printability at the sub-32-nm half-pitch / Sungmin Huh [and others] -- Sub-30-nm defect removal on EUV substrates / Abbas Rastegar [and others] -- Innovative processes investigation for photomask pod conditioning and drying / J.M. Foray [and others] -- High speed (>100 Gbps) key components for a scalable optical data link to be implemented in future maskless lithography applications / A. Paraskevopoulos [and others] -- Molecular dynamics study on mold fracture by nanoscale defects in nanoimprint lithography / K. Tada [and others] -- Advanced proximity matching with pattern matcher / Alexander Serebryakov [and others] -- Mounting methodologies to measure EUV reticle nonflatness / Venkata Siva Battula [and others] -- CDP: application of focus drilling / S. Geisler [and others] -- MeRiT repair verification using in-die phase metrology Phame / Ute Buttgereit, Robert Birkner, and Robert Stelzner -- Design verification for sub-70-nm DRAM nodes via metal fix using E-beam direct write / K. Keil [and others]
Dimensions
unknown
Extent
1 online resource
File format
unknown
Form of item
online
Isbn
9780819477705
Lccn
2010459382
Level of compression
unknown
Media category
computer
Media MARC source
rdamedia
Media type code
c
Other physical details
illustrations (some color).
Quality assurance targets
unknown
Reformatting quality
unknown
Sound
unknown sound
Specific material designation
remote

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