Coverart for item
The Resource Advances in Patterning Materials and Processes XXXII : 23-26 February 2015, San Jose, California, United States, Thomas I. Wallow, Christoph K. Hohle, editors ; sponsored by SPIE ; cosponsored by Tokyo Ohka Kogyo America, Inc. (United States); published by SPIE

Advances in Patterning Materials and Processes XXXII : 23-26 February 2015, San Jose, California, United States, Thomas I. Wallow, Christoph K. Hohle, editors ; sponsored by SPIE ; cosponsored by Tokyo Ohka Kogyo America, Inc. (United States); published by SPIE

Label
Advances in Patterning Materials and Processes XXXII : 23-26 February 2015, San Jose, California, United States
Title
Advances in Patterning Materials and Processes XXXII
Title remainder
23-26 February 2015, San Jose, California, United States
Statement of responsibility
Thomas I. Wallow, Christoph K. Hohle, editors ; sponsored by SPIE ; cosponsored by Tokyo Ohka Kogyo America, Inc. (United States); published by SPIE
Title variation
  • Advances in patterning materials and processes 32
  • Advances in patterning materials and processes thirty-two
Contributor
Editor
Issuing body
Sponsoring body
Subject
Genre
Language
eng
Summary
'Proceedings of SPIE' presents the original research papers presented at SPIE conferences and other high-quality conferences in the broad-ranging fields of optics and photonics. These books provide prompt access to the latest innovations in research and technology in their respective fields
Member of
Cataloging source
COO
Dewey number
620.11
Illustrations
illustrations
Index
no index present
LC call number
TK7874
LC item number
.A25 2015e
Literary form
non fiction
Nature of contents
  • dictionaries
  • bibliography
http://library.link/vocab/relatedWorkOrContributorName
  • Wallow, Thomas Ingolf
  • Hohle, Christoph K.
  • SPIE (Society)
Series statement
Proceedings of SPIE,
Series volume
volume 9425
http://library.link/vocab/subjectName
  • Photoresists
  • Microlithography
Label
Advances in Patterning Materials and Processes XXXII : 23-26 February 2015, San Jose, California, United States, Thomas I. Wallow, Christoph K. Hohle, editors ; sponsored by SPIE ; cosponsored by Tokyo Ohka Kogyo America, Inc. (United States); published by SPIE
Instantiates
Publication
Copyright
Bibliography note
Includes bibliographical references
Carrier category
online resource
Carrier category code
cr
Carrier MARC source
rdacarrier
Content category
text
Content type code
txt
Content type MARC source
rdacontent
Dimensions
unknown
Extent
1 online resource
Form of item
online
Isbn
9781628415278
Media category
computer
Media MARC source
rdamedia
Media type code
c
Other physical details
illustrations (some color).
Specific material designation
remote
Label
Advances in Patterning Materials and Processes XXXII : 23-26 February 2015, San Jose, California, United States, Thomas I. Wallow, Christoph K. Hohle, editors ; sponsored by SPIE ; cosponsored by Tokyo Ohka Kogyo America, Inc. (United States); published by SPIE
Publication
Copyright
Bibliography note
Includes bibliographical references
Carrier category
online resource
Carrier category code
cr
Carrier MARC source
rdacarrier
Content category
text
Content type code
txt
Content type MARC source
rdacontent
Dimensions
unknown
Extent
1 online resource
Form of item
online
Isbn
9781628415278
Media category
computer
Media MARC source
rdamedia
Media type code
c
Other physical details
illustrations (some color).
Specific material designation
remote

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