Coverart for item
The Resource Advances in patterning materials and processes XXXI : 24-27 February 2014, San Jose, California, United States, Thomas I. Wallow, Christoph K. Hohle, editors ; sponsored by SPIE ; cosponsored by Tokyo Ohka Kogyo America, Inc. (United States); published by SPIE

Advances in patterning materials and processes XXXI : 24-27 February 2014, San Jose, California, United States, Thomas I. Wallow, Christoph K. Hohle, editors ; sponsored by SPIE ; cosponsored by Tokyo Ohka Kogyo America, Inc. (United States); published by SPIE

Label
Advances in patterning materials and processes XXXI : 24-27 February 2014, San Jose, California, United States
Title
Advances in patterning materials and processes XXXI
Title remainder
24-27 February 2014, San Jose, California, United States
Statement of responsibility
Thomas I. Wallow, Christoph K. Hohle, editors ; sponsored by SPIE ; cosponsored by Tokyo Ohka Kogyo America, Inc. (United States); published by SPIE
Title variation
  • Advances in patterning materials and processes 31
  • Advances in patterning materials and processes thirty-one
Contributor
Editor
Issuing body
Sponsoring body
Subject
Genre
Language
eng
Related
Member of
Cataloging source
COO
Illustrations
illustrations
Index
no index present
LC call number
TK7874
LC item number
.A25 2014e
Literary form
non fiction
Nature of contents
  • dictionaries
  • bibliography
http://library.link/vocab/relatedWorkOrContributorName
  • Wallow, Thomas Ingolf
  • Hohle, Christoph K.
  • SPIE (Society)
Series statement
Proceedings of SPIE,
Series volume
volume 9051
http://library.link/vocab/subjectName
  • Photoresists
  • Microlithography
Label
Advances in patterning materials and processes XXXI : 24-27 February 2014, San Jose, California, United States, Thomas I. Wallow, Christoph K. Hohle, editors ; sponsored by SPIE ; cosponsored by Tokyo Ohka Kogyo America, Inc. (United States); published by SPIE
Instantiates
Publication
Copyright
Note
Previous conference proceedings titled: Advances in resist materials and processing technology XXX
Bibliography note
Includes bibliographical references
Carrier category
online resource
Carrier category code
cr
Carrier MARC source
rdacarrier
Content category
text
Content type code
txt
Content type MARC source
rdacontent
Dimensions
unknown
Extent
1 online resource
Form of item
online
Isbn
9780819499745
Media category
computer
Media MARC source
rdamedia
Media type code
c
Other physical details
illustrations (some color).
Specific material designation
remote
Label
Advances in patterning materials and processes XXXI : 24-27 February 2014, San Jose, California, United States, Thomas I. Wallow, Christoph K. Hohle, editors ; sponsored by SPIE ; cosponsored by Tokyo Ohka Kogyo America, Inc. (United States); published by SPIE
Publication
Copyright
Note
Previous conference proceedings titled: Advances in resist materials and processing technology XXX
Bibliography note
Includes bibliographical references
Carrier category
online resource
Carrier category code
cr
Carrier MARC source
rdacarrier
Content category
text
Content type code
txt
Content type MARC source
rdacontent
Dimensions
unknown
Extent
1 online resource
Form of item
online
Isbn
9780819499745
Media category
computer
Media MARC source
rdamedia
Media type code
c
Other physical details
illustrations (some color).
Specific material designation
remote

Library Locations

Processing Feedback ...