Coverart for item
The Resource Advances in resist materials and processing technology XXVII : 22-24 February 2010, San Jose, California, United States, Robert D. Allen, Mark H. Somervell, editors ; sponsored by SPIE ; cooperating organization, SEMATECH Inc. (United States)

Advances in resist materials and processing technology XXVII : 22-24 February 2010, San Jose, California, United States, Robert D. Allen, Mark H. Somervell, editors ; sponsored by SPIE ; cooperating organization, SEMATECH Inc. (United States)

Label
Advances in resist materials and processing technology XXVII : 22-24 February 2010, San Jose, California, United States
Title
Advances in resist materials and processing technology XXVII
Title remainder
22-24 February 2010, San Jose, California, United States
Statement of responsibility
Robert D. Allen, Mark H. Somervell, editors ; sponsored by SPIE ; cooperating organization, SEMATECH Inc. (United States)
Contributor
Subject
Genre
Language
eng
Member of
Cataloging source
NHM
Dewey number
621.3815/31
Illustrations
illustrations
Index
no index present
LC call number
TK7874
LC item number
.A25 2010
Literary form
non fiction
Nature of contents
  • dictionaries
  • bibliography
http://library.link/vocab/relatedWorkOrContributorDate
1973-
http://library.link/vocab/relatedWorkOrContributorName
  • Allen, Robert D.
  • Somervell, Mark Howell
  • SPIE (Society)
Series statement
Proceedings of SPIE,
Series volume
v. 7639
http://library.link/vocab/subjectName
  • Photoresists
  • Microlithography
Label
Advances in resist materials and processing technology XXVII : 22-24 February 2010, San Jose, California, United States, Robert D. Allen, Mark H. Somervell, editors ; sponsored by SPIE ; cooperating organization, SEMATECH Inc. (United States)
Instantiates
Publication
Note
Title from PDF screen (SPIE digital library, viewed April 20, 2010)
Bibliography note
Includes bibliographical references
Carrier category
online resource
Carrier category code
cr
Carrier MARC source
rdacarrier
Content category
text
Content type code
txt
Content type MARC source
rdacontent
Dimensions
unknown
Extent
1 online resource
Form of item
online
Isbn
9780819480538
Media category
computer
Media MARC source
rdamedia
Media type code
c
Other physical details
illustrations (some color).
Specific material designation
remote
Label
Advances in resist materials and processing technology XXVII : 22-24 February 2010, San Jose, California, United States, Robert D. Allen, Mark H. Somervell, editors ; sponsored by SPIE ; cooperating organization, SEMATECH Inc. (United States)
Publication
Note
Title from PDF screen (SPIE digital library, viewed April 20, 2010)
Bibliography note
Includes bibliographical references
Carrier category
online resource
Carrier category code
cr
Carrier MARC source
rdacarrier
Content category
text
Content type code
txt
Content type MARC source
rdacontent
Dimensions
unknown
Extent
1 online resource
Form of item
online
Isbn
9780819480538
Media category
computer
Media MARC source
rdamedia
Media type code
c
Other physical details
illustrations (some color).
Specific material designation
remote

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