Coverart for item
The Resource Advances in resist materials and processing technology XXV : 25-27 February 2008, San Jose, California, USA, Clifford L. Henderson, editor ; sponsored by SPIE ; cooperating organization, SEMATECH (USA), (electronic book)

Advances in resist materials and processing technology XXV : 25-27 February 2008, San Jose, California, USA, Clifford L. Henderson, editor ; sponsored by SPIE ; cooperating organization, SEMATECH (USA), (electronic book)

Label
Advances in resist materials and processing technology XXV : 25-27 February 2008, San Jose, California, USA
Title
Advances in resist materials and processing technology XXV
Title remainder
25-27 February 2008, San Jose, California, USA
Statement of responsibility
Clifford L. Henderson, editor ; sponsored by SPIE ; cooperating organization, SEMATECH (USA)
Contributor
Subject
Genre
Language
eng
Member of
Cataloging source
STF
Illustrations
illustrations
Index
no index present
LC call number
TK7874
Literary form
non fiction
Nature of contents
  • dictionaries
  • bibliography
http://library.link/vocab/relatedWorkOrContributorName
  • Henderson, Clifford L.
  • SPIE (Society)
  • International SEMATECH.
Series statement
Proceedings of SPIE,
Series volume
6923
http://library.link/vocab/subjectName
  • Photoresists
  • Microlithography
Label
Advances in resist materials and processing technology XXV : 25-27 February 2008, San Jose, California, USA, Clifford L. Henderson, editor ; sponsored by SPIE ; cooperating organization, SEMATECH (USA), (electronic book)
Instantiates
Publication
Note
Previous conference proceedings entitled: Advances in resist technology and processing
Bibliography note
Includes bibliographical references and author index
Color
mixed
Dimensions
28 cm.
Dimensions
unknown
Extent
2 v.
Form of item
electronic
Isbn
9780819471086
Other physical details
ill. (some col.)
Reproduction note
Electronic resource.
Specific material designation
remote
Label
Advances in resist materials and processing technology XXV : 25-27 February 2008, San Jose, California, USA, Clifford L. Henderson, editor ; sponsored by SPIE ; cooperating organization, SEMATECH (USA), (electronic book)
Publication
Note
Previous conference proceedings entitled: Advances in resist technology and processing
Bibliography note
Includes bibliographical references and author index
Color
mixed
Dimensions
28 cm.
Dimensions
unknown
Extent
2 v.
Form of item
electronic
Isbn
9780819471086
Other physical details
ill. (some col.)
Reproduction note
Electronic resource.
Specific material designation
remote

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