Coverart for item
The Resource Advances in resist materials and processing technology XXVIII : 28 February-2 March 2011, San Jose, California, United States, Robert D. Allen, Mark H. Somervell, editors ; sponsored and published by SPIE

Advances in resist materials and processing technology XXVIII : 28 February-2 March 2011, San Jose, California, United States, Robert D. Allen, Mark H. Somervell, editors ; sponsored and published by SPIE

Label
Advances in resist materials and processing technology XXVIII : 28 February-2 March 2011, San Jose, California, United States
Title
Advances in resist materials and processing technology XXVIII
Title remainder
28 February-2 March 2011, San Jose, California, United States
Statement of responsibility
Robert D. Allen, Mark H. Somervell, editors ; sponsored and published by SPIE
Contributor
Subject
Genre
Language
eng
Member of
Cataloging source
NHM
Illustrations
illustrations
Index
no index present
LC call number
TK7874
LC item number
.A25 2011e
Literary form
non fiction
Nature of contents
  • dictionaries
  • bibliography
http://library.link/vocab/relatedWorkOrContributorDate
1973-
http://library.link/vocab/relatedWorkOrContributorName
  • Allen, Robert D.
  • Somervell, Mark Howell
  • SPIE (Society)
Series statement
Proceedings of SPIE,
Series volume
v. 7972
http://library.link/vocab/subjectName
  • Photoresists
  • Microlithography
Label
Advances in resist materials and processing technology XXVIII : 28 February-2 March 2011, San Jose, California, United States, Robert D. Allen, Mark H. Somervell, editors ; sponsored and published by SPIE
Instantiates
Publication
Note
Title from title screen (SPIE digital library, viewed May 20, 2011)
Bibliography note
Includes bibliographical references
Carrier category
online resource
Carrier category code
cr
Carrier MARC source
rdacarrier
Content category
text
Content type code
txt
Content type MARC source
rdacontent
Dimensions
unknown
Extent
1 online resource
Form of item
online
Isbn
9780819485311
Media category
computer
Media MARC source
rdamedia
Media type code
c
Other physical details
illustrations (some color).
Specific material designation
remote
Label
Advances in resist materials and processing technology XXVIII : 28 February-2 March 2011, San Jose, California, United States, Robert D. Allen, Mark H. Somervell, editors ; sponsored and published by SPIE
Publication
Note
Title from title screen (SPIE digital library, viewed May 20, 2011)
Bibliography note
Includes bibliographical references
Carrier category
online resource
Carrier category code
cr
Carrier MARC source
rdacarrier
Content category
text
Content type code
txt
Content type MARC source
rdacontent
Dimensions
unknown
Extent
1 online resource
Form of item
online
Isbn
9780819485311
Media category
computer
Media MARC source
rdamedia
Media type code
c
Other physical details
illustrations (some color).
Specific material designation
remote

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