The Resource Advances in resist technology and processing XVI : Microlithography 1999 : 15-17 March, 1999, Santa Clara, California, Will Conley, chair/editor ; sponsored by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMI--Semiconductor Equipment and Materials International, (electronic book)

Advances in resist technology and processing XVI : Microlithography 1999 : 15-17 March, 1999, Santa Clara, California, Will Conley, chair/editor ; sponsored by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMI--Semiconductor Equipment and Materials International, (electronic book)

Label
Advances in resist technology and processing XVI : Microlithography 1999 : 15-17 March, 1999, Santa Clara, California
Title
Advances in resist technology and processing XVI
Title remainder
Microlithography 1999 : 15-17 March, 1999, Santa Clara, California
Statement of responsibility
Will Conley, chair/editor ; sponsored by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMI--Semiconductor Equipment and Materials International
Title variation
Microlithography 1999
Contributor
Subject
Genre
Language
eng
Member of
Cataloging source
SPIED
Illustrations
illustrations
Index
index present
Literary form
non fiction
Nature of contents
  • dictionaries
  • bibliography
http://library.link/vocab/relatedWorkOrContributorName
  • Conley, Willard
  • Society of Photo-optical Instrumentation Engineers
  • Semiconductor Equipment and Materials International.
  • SPIE Digital Library
Series statement
SPIE proceedings series,
Series volume
3678
http://library.link/vocab/subjectName
  • Photoresists
  • Microlithography
Label
Advances in resist technology and processing XVI : Microlithography 1999 : 15-17 March, 1999, Santa Clara, California, Will Conley, chair/editor ; sponsored by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMI--Semiconductor Equipment and Materials International, (electronic book)
Instantiates
Publication
Bibliography note
Includes bibliographical references and author index
Dimensions
28 cm.
Dimensions
unknown
Extent
2 v. (xv, 1402 p.)
Form of item
electronic
Other physical details
ill.
Reproduction note
Electronic resource.
Specific material designation
remote
Label
Advances in resist technology and processing XVI : Microlithography 1999 : 15-17 March, 1999, Santa Clara, California, Will Conley, chair/editor ; sponsored by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMI--Semiconductor Equipment and Materials International, (electronic book)
Publication
Bibliography note
Includes bibliographical references and author index
Dimensions
28 cm.
Dimensions
unknown
Extent
2 v. (xv, 1402 p.)
Form of item
electronic
Other physical details
ill.
Reproduction note
Electronic resource.
Specific material designation
remote

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