The Resource Advances in resist technology and processing XVIII : 26-28 February, 2001, Santa Clara, [California] USA, Francis M. Houlihan, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH, (electronic book)

Advances in resist technology and processing XVIII : 26-28 February, 2001, Santa Clara, [California] USA, Francis M. Houlihan, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH, (electronic book)

Label
Advances in resist technology and processing XVIII : 26-28 February, 2001, Santa Clara, [California] USA
Title
Advances in resist technology and processing XVIII
Title remainder
26-28 February, 2001, Santa Clara, [California] USA
Statement of responsibility
Francis M. Houlihan, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH
Contributor
Subject
Genre
Language
eng
Member of
Cataloging source
SPIED
Illustrations
illustrations
Index
index present
Literary form
non fiction
Nature of contents
  • dictionaries
  • bibliography
http://library.link/vocab/relatedWorkOrContributorName
  • Houlihan, Francis M
  • Society of Photo-optical Instrumentation Engineers
  • Semiconductor Equipment and Materials International.
  • International SEMATECH.
  • SPIE Digital Library
Series statement
SPIE proceedings series
Series volume
4345
http://library.link/vocab/subjectName
  • Photoresists
  • Microlithography
Label
Advances in resist technology and processing XVIII : 26-28 February, 2001, Santa Clara, [California] USA, Francis M. Houlihan, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH, (electronic book)
Instantiates
Publication
Bibliography note
Includes bibliographical references and author index
Dimensions
28 cm.
Dimensions
unknown
Extent
2 v. (xxix, 1084 p.)
Form of item
electronic
Other physical details
ill.
Reproduction note
Electronic resource.
Specific material designation
remote
Label
Advances in resist technology and processing XVIII : 26-28 February, 2001, Santa Clara, [California] USA, Francis M. Houlihan, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH, (electronic book)
Publication
Bibliography note
Includes bibliographical references and author index
Dimensions
28 cm.
Dimensions
unknown
Extent
2 v. (xxix, 1084 p.)
Form of item
electronic
Other physical details
ill.
Reproduction note
Electronic resource.
Specific material designation
remote

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