The Resource Alternative Lithographic Technologies VII : 23-26 February 2015, San Jose, California, United States, Douglas J. Resnick, Christopher Bencher, editors ; sponsored by SPIE ; cosponsored by DNS Electronics, LLC ; published by SPIE
Alternative Lithographic Technologies VII : 23-26 February 2015, San Jose, California, United States, Douglas J. Resnick, Christopher Bencher, editors ; sponsored by SPIE ; cosponsored by DNS Electronics, LLC ; published by SPIE
Resource Information
The item Alternative Lithographic Technologies VII : 23-26 February 2015, San Jose, California, United States, Douglas J. Resnick, Christopher Bencher, editors ; sponsored by SPIE ; cosponsored by DNS Electronics, LLC ; published by SPIE represents a specific, individual, material embodiment of a distinct intellectual or artistic creation found in University of Liverpool.This item is available to borrow from 1 library branch.
Resource Information
The item Alternative Lithographic Technologies VII : 23-26 February 2015, San Jose, California, United States, Douglas J. Resnick, Christopher Bencher, editors ; sponsored by SPIE ; cosponsored by DNS Electronics, LLC ; published by SPIE represents a specific, individual, material embodiment of a distinct intellectual or artistic creation found in University of Liverpool.
This item is available to borrow from 1 library branch.
- Summary
- 'Proceedings of SPIE' presents the original research papers presented at SPIE conferences and other high-quality conferences in the broad-ranging fields of optics and photonics. These books provide prompt access to the latest innovations in research and technology in their respective fields
- Language
- eng
- Label
- Alternative Lithographic Technologies VII : 23-26 February 2015, San Jose, California, United States
- Title
- Alternative Lithographic Technologies VII
- Title remainder
- 23-26 February 2015, San Jose, California, United States
- Statement of responsibility
- Douglas J. Resnick, Christopher Bencher, editors ; sponsored by SPIE ; cosponsored by DNS Electronics, LLC ; published by SPIE
- Title variation
-
- Alternative Lithographic Technologies 7
- Alternative Lithographic Technologies seven
- Language
- eng
- Summary
- 'Proceedings of SPIE' presents the original research papers presented at SPIE conferences and other high-quality conferences in the broad-ranging fields of optics and photonics. These books provide prompt access to the latest innovations in research and technology in their respective fields
- Cataloging source
- COO
- Dewey number
- 621.381531
- Illustrations
- illustrations
- Index
- no index present
- LC call number
- TK7872.M3
- LC item number
- A48 2015e
- Literary form
- non fiction
- Nature of contents
-
- dictionaries
- bibliography
- http://library.link/vocab/relatedWorkOrContributorName
-
- Resnick, Douglas J.
- Bencher, Christopher
- SPIE (Society)
- Series statement
- Proceedings of SPIE,
- Series volume
- volume 9423
- http://library.link/vocab/subjectName
-
- Extreme ultraviolet lithography
- Lithography, Electron beam
- Microlithography
- Masks (Electronics)
- Label
- Alternative Lithographic Technologies VII : 23-26 February 2015, San Jose, California, United States, Douglas J. Resnick, Christopher Bencher, editors ; sponsored by SPIE ; cosponsored by DNS Electronics, LLC ; published by SPIE
- Bibliography note
- Includes bibliographical references
- Carrier category
- online resource
- Carrier category code
-
- cr
- Carrier MARC source
- rdacarrier
- Content category
- text
- Content type code
-
- txt
- Content type MARC source
- rdacontent
- Dimensions
- unknown
- Extent
- 1 online resource
- Form of item
- online
- Isbn
- 9781628415254
- Media category
- computer
- Media MARC source
- rdamedia
- Media type code
-
- c
- Other physical details
- illustrations (some color).
- Specific material designation
- remote
- Label
- Alternative Lithographic Technologies VII : 23-26 February 2015, San Jose, California, United States, Douglas J. Resnick, Christopher Bencher, editors ; sponsored by SPIE ; cosponsored by DNS Electronics, LLC ; published by SPIE
- Bibliography note
- Includes bibliographical references
- Carrier category
- online resource
- Carrier category code
-
- cr
- Carrier MARC source
- rdacarrier
- Content category
- text
- Content type code
-
- txt
- Content type MARC source
- rdacontent
- Dimensions
- unknown
- Extent
- 1 online resource
- Form of item
- online
- Isbn
- 9781628415254
- Media category
- computer
- Media MARC source
- rdamedia
- Media type code
-
- c
- Other physical details
- illustrations (some color).
- Specific material designation
- remote
Subject
- Extreme ultraviolet lithography -- Congresses
- Lithography, Electron beam -- Congresses
- Masks (Electronics) -- Congresses
- Microlithography -- Industrial applications -- Congresses
Genre
Member of
- Online access with subscription: SPIE digital library
- Proceedings of SPIE--the International Society for Optical Engineering, v. 9423.
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<div class="citation" vocab="http://schema.org/"><i class="fa fa-external-link-square fa-fw"></i> Data from <span resource="http://link.liverpool.ac.uk/portal/Alternative-Lithographic-Technologies-VII--23-26/GnzA8oq-7EE/" typeof="Book http://bibfra.me/vocab/lite/Item"><span property="name http://bibfra.me/vocab/lite/label"><a href="http://link.liverpool.ac.uk/portal/Alternative-Lithographic-Technologies-VII--23-26/GnzA8oq-7EE/">Alternative Lithographic Technologies VII : 23-26 February 2015, San Jose, California, United States, Douglas J. Resnick, Christopher Bencher, editors ; sponsored by SPIE ; cosponsored by DNS Electronics, LLC ; published by SPIE</a></span> - <span property="potentialAction" typeOf="OrganizeAction"><span property="agent" typeof="LibrarySystem http://library.link/vocab/LibrarySystem" resource="http://link.liverpool.ac.uk/"><span property="name http://bibfra.me/vocab/lite/label"><a property="url" href="http://link.liverpool.ac.uk/">University of Liverpool</a></span></span></span></span></div>
