Coverart for item
The Resource Alternative lithographic technologies : 24-26 February 2009, San Jose, California, United States, Frank M. Schellenberg, Bruno M. La Fontaine, editors ; sponsored by SPIE ; cooperating organization, SEMATECH Inc

Alternative lithographic technologies : 24-26 February 2009, San Jose, California, United States, Frank M. Schellenberg, Bruno M. La Fontaine, editors ; sponsored by SPIE ; cooperating organization, SEMATECH Inc

Label
Alternative lithographic technologies : 24-26 February 2009, San Jose, California, United States
Title
Alternative lithographic technologies
Title remainder
24-26 February 2009, San Jose, California, United States
Statement of responsibility
Frank M. Schellenberg, Bruno M. La Fontaine, editors ; sponsored by SPIE ; cooperating organization, SEMATECH Inc
Contributor
Subject
Genre
Language
eng
Related
Member of
Cataloging source
STF
Dewey number
621.3815/31
Illustrations
illustrations
Index
no index present
LC call number
TK7872.M3
Literary form
non fiction
Nature of contents
  • dictionaries
  • bibliography
http://library.link/vocab/relatedWorkOrContributorDate
1959-
http://library.link/vocab/relatedWorkOrContributorName
  • Schellenberg, F. M.
  • La Fontaine, Bruno M.
  • SPIE (Society)
  • International SEMATECH.
Series statement
Proceedings of SPIE,
Series volume
v. 7271
http://library.link/vocab/subjectName
  • Extreme ultraviolet lithography
  • Lithography, Electron beam
  • Microlithography
  • Masks (Electronics)
Label
Alternative lithographic technologies : 24-26 February 2009, San Jose, California, United States, Frank M. Schellenberg, Bruno M. La Fontaine, editors ; sponsored by SPIE ; cooperating organization, SEMATECH Inc
Instantiates
Publication
Note
Previous conference proceedings entitled: Emerging lithographic technologies
Bibliography note
Includes bibliographical references and author index
Carrier category
online resource
Carrier category code
  • cr
Carrier MARC source
rdacarrier
Color
mixed
Content category
text
Content type code
  • txt
Content type MARC source
rdacontent
Dimensions
28 cm.
Dimensions
unknown
Extent
2 volumes
Form of item
online
Isbn
9780819475244
Lccn
2010455661
Media category
computer
Media MARC source
rdamedia
Media type code
  • c
Other physical details
illustrations
Reproduction note
Electronic reproduction.
Specific material designation
remote
Label
Alternative lithographic technologies : 24-26 February 2009, San Jose, California, United States, Frank M. Schellenberg, Bruno M. La Fontaine, editors ; sponsored by SPIE ; cooperating organization, SEMATECH Inc
Publication
Note
Previous conference proceedings entitled: Emerging lithographic technologies
Bibliography note
Includes bibliographical references and author index
Carrier category
online resource
Carrier category code
  • cr
Carrier MARC source
rdacarrier
Color
mixed
Content category
text
Content type code
  • txt
Content type MARC source
rdacontent
Dimensions
28 cm.
Dimensions
unknown
Extent
2 volumes
Form of item
online
Isbn
9780819475244
Lccn
2010455661
Media category
computer
Media MARC source
rdamedia
Media type code
  • c
Other physical details
illustrations
Reproduction note
Electronic reproduction.
Specific material designation
remote

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