Coverart for item
The Resource Alternative lithographic technologies II : 23-25 February 2010, San Jose, California, United States, Daniel J.C. Herr, editor ; sponsored and published by SPIE ; cooperating organization, SEMATECH Inc

Alternative lithographic technologies II : 23-25 February 2010, San Jose, California, United States, Daniel J.C. Herr, editor ; sponsored and published by SPIE ; cooperating organization, SEMATECH Inc

Label
Alternative lithographic technologies II : 23-25 February 2010, San Jose, California, United States
Title
Alternative lithographic technologies II
Title remainder
23-25 February 2010, San Jose, California, United States
Statement of responsibility
Daniel J.C. Herr, editor ; sponsored and published by SPIE ; cooperating organization, SEMATECH Inc
Title variation
  • Alternative lithographic technologies 2
  • Alternative lithographic technologies two
Contributor
Subject
Genre
Language
eng
Member of
Cataloging source
NHM
Dewey number
621.3815/31
Illustrations
illustrations
Index
no index present
LC call number
TK7872.M3
LC item number
A48 2010
Literary form
non fiction
Nature of contents
  • dictionaries
  • bibliography
http://library.link/vocab/relatedWorkOrContributorName
  • Herr, Daniel J. C.
  • SPIE (Society)
  • SEMATECH (Organization)
Series statement
Proceedings of SPIE,
Series volume
v. 7637
http://library.link/vocab/subjectName
  • Extreme ultraviolet lithography
  • Lithography, Electron beam
  • Microlithography
  • Masks (Electronics)
Label
Alternative lithographic technologies II : 23-25 February 2010, San Jose, California, United States, Daniel J.C. Herr, editor ; sponsored and published by SPIE ; cooperating organization, SEMATECH Inc
Instantiates
Publication
Note
Title from PDF title page (SPIE digital library, viewed April 20, 2010)
Bibliography note
Includes bibliographical references
Carrier category
online resource
Carrier category code
  • cr
Carrier MARC source
rdacarrier
Content category
text
Content type code
  • txt
Content type MARC source
rdacontent
Dimensions
unknown
Extent
1 online resource
Form of item
online
Isbn
9780819480514
Media category
computer
Media MARC source
rdamedia
Media type code
  • c
Other physical details
illustrations (some color).
Specific material designation
remote
Label
Alternative lithographic technologies II : 23-25 February 2010, San Jose, California, United States, Daniel J.C. Herr, editor ; sponsored and published by SPIE ; cooperating organization, SEMATECH Inc
Publication
Note
Title from PDF title page (SPIE digital library, viewed April 20, 2010)
Bibliography note
Includes bibliographical references
Carrier category
online resource
Carrier category code
  • cr
Carrier MARC source
rdacarrier
Content category
text
Content type code
  • txt
Content type MARC source
rdacontent
Dimensions
unknown
Extent
1 online resource
Form of item
online
Isbn
9780819480514
Media category
computer
Media MARC source
rdamedia
Media type code
  • c
Other physical details
illustrations (some color).
Specific material designation
remote

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