Coverart for item
The Resource An introduction to time-of-flight secondary ion mass spectrometry (ToF-SIMS) and its application to materials science, Sarah Fearn, (electronic book)

An introduction to time-of-flight secondary ion mass spectrometry (ToF-SIMS) and its application to materials science, Sarah Fearn, (electronic book)

Label
An introduction to time-of-flight secondary ion mass spectrometry (ToF-SIMS) and its application to materials science
Title
An introduction to time-of-flight secondary ion mass spectrometry (ToF-SIMS) and its application to materials science
Statement of responsibility
Sarah Fearn
Creator
Subject
Language
eng
Summary
This book highlights the application of Time-of-Flight Secondary Ion Mass Spectrometry (ToF-SIMS) for high-resolution surface analysis and characterization of materials. While providing a brief overview of the principles of SIMS, it also provides examples of how dual-beam ToF-SIMS is used to investigate a range of materials systems and properties. Over the years, SIMS instrumentation has dramatically changed since the earliest secondary ion mass spectrometers were first developed. Instruments were once dedicated to either the depth profiling of materials using high-ion-beam currents to analyse near surface to bulk regions of materials (dynamic SIMS), or time-of-flight instruments that produced complex mass spectra of the very outer-most surface of samples, using very low-beam currents (static SIMS). Now, with the development of dual-beam instruments these two very distinct fields now overlap
Member of
Cataloging source
CaBNVSL
http://library.link/vocab/creatorName
Fearn, Sarah
Dewey number
543/.65
Illustrations
illustrations
Index
no index present
Intended audience
Materials scientists, researchers and engineers
Literary form
non fiction
Nature of contents
  • dictionaries
  • bibliography
http://library.link/vocab/subjectName
  • Secondary ion mass spectrometry
  • Time-of-flight mass spectrometry
  • Materials science
Target audience
adult
Label
An introduction to time-of-flight secondary ion mass spectrometry (ToF-SIMS) and its application to materials science, Sarah Fearn, (electronic book)
Instantiates
Publication
Note
  • "Version: 20151001"--Title page verso
  • "A Morgan & Claypool publication as part of IOP Concise Physics"--Title page verso
Bibliography note
Includes bibliographical references
Color
multicolored
Contents
  • Preface -- Author biography -- 1. Introduction -- 1.1. Overview -- 1.2. Basic principles
  • 2. Practical requirements -- 2.1. Ion generation -- 2.2. Primary and sputter ion beam sources -- 2.3. Mass analysis -- 2.4. Ion detection -- 2.5. Ultra high vacuum
  • 3. Modes of analysis -- 3.1. High-resolution mass spectra -- 3.2. Depth profiling
  • 4. Ion beam-target interactions -- 4.1. Ion beam induced atomic mixing -- 4.2. Beam induced surface roughening and uneven etching -- 4.3. Beam induced segregation -- 4.4. Other beam induced effects -- 4.5. Depth profiling with cluster ion beams
  • 5. Application to materials science -- 5.1. Biomaterials and tissue studies -- 5.2. Glass corrosion -- 5.3. Ceramic oxides -- 5.4. Semiconductor analysis -- 5.5. Organic electronics -- 6. Summary
Control code
9781681740881
Dimensions
unknown
Extent
1 online resource (various pagings)
Form of item
  • online
  • electronic
Isbn
9781681740881
Isbn Type
(ebk)
Other physical details
ill. (some col.)
Specific material designation
remote
System details
System requirements: Adobe Acrobat Reader
Label
An introduction to time-of-flight secondary ion mass spectrometry (ToF-SIMS) and its application to materials science, Sarah Fearn, (electronic book)
Publication
Note
  • "Version: 20151001"--Title page verso
  • "A Morgan & Claypool publication as part of IOP Concise Physics"--Title page verso
Bibliography note
Includes bibliographical references
Color
multicolored
Contents
  • Preface -- Author biography -- 1. Introduction -- 1.1. Overview -- 1.2. Basic principles
  • 2. Practical requirements -- 2.1. Ion generation -- 2.2. Primary and sputter ion beam sources -- 2.3. Mass analysis -- 2.4. Ion detection -- 2.5. Ultra high vacuum
  • 3. Modes of analysis -- 3.1. High-resolution mass spectra -- 3.2. Depth profiling
  • 4. Ion beam-target interactions -- 4.1. Ion beam induced atomic mixing -- 4.2. Beam induced surface roughening and uneven etching -- 4.3. Beam induced segregation -- 4.4. Other beam induced effects -- 4.5. Depth profiling with cluster ion beams
  • 5. Application to materials science -- 5.1. Biomaterials and tissue studies -- 5.2. Glass corrosion -- 5.3. Ceramic oxides -- 5.4. Semiconductor analysis -- 5.5. Organic electronics -- 6. Summary
Control code
9781681740881
Dimensions
unknown
Extent
1 online resource (various pagings)
Form of item
  • online
  • electronic
Isbn
9781681740881
Isbn Type
(ebk)
Other physical details
ill. (some col.)
Specific material designation
remote
System details
System requirements: Adobe Acrobat Reader

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