Coverart for item
The Resource Colloquium on "Application of plasma technology to surface processing - recent developments in modelling and diagnostics for process control and optimization" : on Thursday, 30 March 1995, organised by Professional Group S3 (Electron physics, discharges and applications)

Colloquium on "Application of plasma technology to surface processing - recent developments in modelling and diagnostics for process control and optimization" : on Thursday, 30 March 1995, organised by Professional Group S3 (Electron physics, discharges and applications)

Label
Colloquium on "Application of plasma technology to surface processing - recent developments in modelling and diagnostics for process control and optimization" : on Thursday, 30 March 1995
Title
Colloquium on "Application of plasma technology to surface processing - recent developments in modelling and diagnostics for process control and optimization"
Title remainder
on Thursday, 30 March 1995
Statement of responsibility
organised by Professional Group S3 (Electron physics, discharges and applications)
Title variation
  • Application of plasma technology to surface processing
  • IEE Colloqium on Application of Plasma Technology to Surface Processing - Recent Developments in Modelling and Diagnostics for Process Control and Optimization
  • Application of Plasma Technology to Surface Processing - Recent Developments in Modelling and Diagnostics for Process Control and Optimization, IEE Colloquium on
Creator
Contributor
Subject
Genre
Language
eng
Member of
Cataloging source
HNK
Illustrations
illustrations
Index
no index present
LC call number
TK7
LC item number
.I4 1995 no.149
Literary form
non fiction
http://bibfra.me/vocab/lite/meetingDate
1995
http://bibfra.me/vocab/lite/meetingName
Colloquium on "Application of Plasma Technology to Surface Processing - Recent Developments in Modelling and Diagnostics for Process Control and Optimization"
Nature of contents
  • dictionaries
  • bibliography
http://library.link/vocab/relatedWorkOrContributorName
  • Institution of Electrical Engineers
  • Institution of Electrical Engineers
http://library.link/vocab/subjectName
Plasma diagnostics
Label
Colloquium on "Application of plasma technology to surface processing - recent developments in modelling and diagnostics for process control and optimization" : on Thursday, 30 March 1995, organised by Professional Group S3 (Electron physics, discharges and applications)
Instantiates
Publication
Note
  • "Digest no: 1995/149."
  • At head of title: Science, Education and Technology Division
Bibliography note
Includes bibliographical references
Carrier category
online resource
Carrier category code
cr
Carrier MARC source
rdacarrier
Content category
text
Content type code
txt
Content type MARC source
rdacontent
Control code
IEEE52308766
Extent
1 online resource (1 volume (various pagings))
Form of item
online
Media category
computer
Media MARC source
rdamedia
Media type code
c
Other physical details
illustrations
Specific material designation
remote
System control number
  • ocm52308766\
  • (OCoLC)52308766
Label
Colloquium on "Application of plasma technology to surface processing - recent developments in modelling and diagnostics for process control and optimization" : on Thursday, 30 March 1995, organised by Professional Group S3 (Electron physics, discharges and applications)
Publication
Note
  • "Digest no: 1995/149."
  • At head of title: Science, Education and Technology Division
Bibliography note
Includes bibliographical references
Carrier category
online resource
Carrier category code
cr
Carrier MARC source
rdacarrier
Content category
text
Content type code
txt
Content type MARC source
rdacontent
Control code
IEEE52308766
Extent
1 online resource (1 volume (various pagings))
Form of item
online
Media category
computer
Media MARC source
rdamedia
Media type code
c
Other physical details
illustrations
Specific material designation
remote
System control number
  • ocm52308766\
  • (OCoLC)52308766

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