The Resource Data analysis and modeling for process control : 26-27 February 2004, Santa Clara, California, USA, Kenneth W. Tobin, Jr., chair/editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International [and] International SEMATECH, (electronic book)

Data analysis and modeling for process control : 26-27 February 2004, Santa Clara, California, USA, Kenneth W. Tobin, Jr., chair/editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International [and] International SEMATECH, (electronic book)

Label
Data analysis and modeling for process control : 26-27 February 2004, Santa Clara, California, USA
Title
Data analysis and modeling for process control
Title remainder
26-27 February 2004, Santa Clara, California, USA
Statement of responsibility
Kenneth W. Tobin, Jr., chair/editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International [and] International SEMATECH
Contributor
Editor
Editor
Subject
Genre
Language
eng
Member of
Cataloging source
SPIED
Illustrations
illustrations
Index
index present
LC call number
TS173
LC item number
.D83 2004
Literary form
non fiction
Nature of contents
  • dictionaries
  • bibliography
http://library.link/vocab/relatedWorkOrContributorName
  • Tobin, Kenneth W.
  • Society of Photo-optical Instrumentation Engineers
  • Semiconductor Equipment and Materials International
  • International SEMATECH
Series statement
SPIE proceedings series,
Series volume
5378
http://library.link/vocab/subjectName
  • Manufacturing processes
  • Manufacturing processes
  • Intelligent control systems
  • Process control
Label
Data analysis and modeling for process control : 26-27 February 2004, Santa Clara, California, USA, Kenneth W. Tobin, Jr., chair/editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International [and] International SEMATECH, (electronic book)
Instantiates
Publication
Bibliography note
Includes bibliographical references and index
Carrier category
online resource
Carrier category code
  • cr
Carrier MARC source
rdacarrier
Content category
text
Content type code
  • txt
Content type MARC source
rdacontent
Dimensions
28 cm.
Dimensions
unknown
Extent
xxx, 248 p.
Form of item
electronic
Media category
computer
Media MARC source
rdamedia
Media type code
  • c
Other physical details
ill.
Reproduction note
Electronic resource.
Sound
unknown sound
Specific material designation
remote
Label
Data analysis and modeling for process control : 26-27 February 2004, Santa Clara, California, USA, Kenneth W. Tobin, Jr., chair/editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International [and] International SEMATECH, (electronic book)
Publication
Bibliography note
Includes bibliographical references and index
Carrier category
online resource
Carrier category code
  • cr
Carrier MARC source
rdacarrier
Content category
text
Content type code
  • txt
Content type MARC source
rdacontent
Dimensions
28 cm.
Dimensions
unknown
Extent
xxx, 248 p.
Form of item
electronic
Media category
computer
Media MARC source
rdamedia
Media type code
  • c
Other physical details
ill.
Reproduction note
Electronic resource.
Sound
unknown sound
Specific material designation
remote

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