The Resource Data analysis and modeling for process control II : 3-4 March, 2005, San Jose, California, USA, Iraj Emami, chair/editor ; Christopher P. Ausschnitt, Kenneth W. Tobin, Jr., cochair/editors ; sponsored by SPIE--the International Society for Optical Engineering ; cooperating organization, International SEMATECH, (electronic book)

Data analysis and modeling for process control II : 3-4 March, 2005, San Jose, California, USA, Iraj Emami, chair/editor ; Christopher P. Ausschnitt, Kenneth W. Tobin, Jr., cochair/editors ; sponsored by SPIE--the International Society for Optical Engineering ; cooperating organization, International SEMATECH, (electronic book)

Label
Data analysis and modeling for process control II : 3-4 March, 2005, San Jose, California, USA
Title
Data analysis and modeling for process control II
Title remainder
3-4 March, 2005, San Jose, California, USA
Statement of responsibility
Iraj Emami, chair/editor ; Christopher P. Ausschnitt, Kenneth W. Tobin, Jr., cochair/editors ; sponsored by SPIE--the International Society for Optical Engineering ; cooperating organization, International SEMATECH
Contributor
Subject
Genre
Language
eng
Member of
Cataloging source
NHM
Illustrations
illustrations
Index
no index present
LC call number
TS183
LC item number
.D37 2005
Literary form
non fiction
Nature of contents
  • dictionaries
  • bibliography
http://library.link/vocab/relatedWorkOrContributorName
  • Emami, Iraj
  • Ausschnitt, Christopher P
  • Tobin, Kenneth W.
  • Society of Photo-optical Instrumentation Engineers
  • International SEMATECH.
  • SPIE Digital Library
Series statement
Proceedings of SPIE,
Series volume
5755
http://library.link/vocab/subjectName
  • Manufacturing processes
  • Manufacturing processes
  • Intelligent control systems
  • Process control
Label
Data analysis and modeling for process control II : 3-4 March, 2005, San Jose, California, USA, Iraj Emami, chair/editor ; Christopher P. Ausschnitt, Kenneth W. Tobin, Jr., cochair/editors ; sponsored by SPIE--the International Society for Optical Engineering ; cooperating organization, International SEMATECH, (electronic book)
Instantiates
Publication
Bibliography note
Includes bibliographical references and author index
Color
multicolored
Dimensions
28 cm.
Dimensions
unknown
Extent
xxxiii, 260 p.
Form of item
electronic
Other physical details
ill.
Reproduction note
Electronic resource.
Specific material designation
remote
Label
Data analysis and modeling for process control II : 3-4 March, 2005, San Jose, California, USA, Iraj Emami, chair/editor ; Christopher P. Ausschnitt, Kenneth W. Tobin, Jr., cochair/editors ; sponsored by SPIE--the International Society for Optical Engineering ; cooperating organization, International SEMATECH, (electronic book)
Publication
Bibliography note
Includes bibliographical references and author index
Color
multicolored
Dimensions
28 cm.
Dimensions
unknown
Extent
xxxiii, 260 p.
Form of item
electronic
Other physical details
ill.
Reproduction note
Electronic resource.
Specific material designation
remote

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