The Resource Data analysis and modeling for process control III : 23 February 2006, San Jose, California, USA, Iraj Emami, Kenneth W. Tobin, Jr., chairs/editors ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMATECH, Inc, (electronic book)

Data analysis and modeling for process control III : 23 February 2006, San Jose, California, USA, Iraj Emami, Kenneth W. Tobin, Jr., chairs/editors ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMATECH, Inc, (electronic book)

Label
Data analysis and modeling for process control III : 23 February 2006, San Jose, California, USA
Title
Data analysis and modeling for process control III
Title remainder
23 February 2006, San Jose, California, USA
Statement of responsibility
Iraj Emami, Kenneth W. Tobin, Jr., chairs/editors ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMATECH, Inc
Contributor
Subject
Genre
Language
eng
Member of
Cataloging source
CSt
Illustrations
illustrations
Index
index present
LC call number
TS183
Literary form
non fiction
Nature of contents
  • dictionaries
  • bibliography
http://library.link/vocab/relatedWorkOrContributorName
  • Emami, Iraj.
  • Tobin, Kenneth W.
  • International SEMATECH.
Series statement
Proceedings of SPIE,
Series volume
6155
http://library.link/vocab/subjectName
  • Manufacturing processes
  • Manufacturing processes
  • Intelligent control systems
  • Process control
Label
Data analysis and modeling for process control III : 23 February 2006, San Jose, California, USA, Iraj Emami, Kenneth W. Tobin, Jr., chairs/editors ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMATECH, Inc, (electronic book)
Instantiates
Publication
Bibliography note
Includes bibliographical references and author index
Color
multicolored
Dimensions
28 cm.
Dimensions
unknown
Extent
1 v. (various pagings)
Form of item
electronic
Other physical details
ill.
Reproduction note
Electronic resource.
Specific material designation
remote
Label
Data analysis and modeling for process control III : 23 February 2006, San Jose, California, USA, Iraj Emami, Kenneth W. Tobin, Jr., chairs/editors ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMATECH, Inc, (electronic book)
Publication
Bibliography note
Includes bibliographical references and author index
Color
multicolored
Dimensions
28 cm.
Dimensions
unknown
Extent
1 v. (various pagings)
Form of item
electronic
Other physical details
ill.
Reproduction note
Electronic resource.
Specific material designation
remote

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