Coverart for item
The Resource Developments in semiconductor microlithography : [seminar] : June 1-3, 1976, San Jose, California, Donald E. Routh [and others] editors ; presented by the Society of Photo-optical Instrumentation Engineers and the Northern California Microphotomask/Masking Working Group, in cooperation with National Aeronautics and Space Administration, International Society for Hybrid Microelectronics

Developments in semiconductor microlithography : [seminar] : June 1-3, 1976, San Jose, California, Donald E. Routh [and others] editors ; presented by the Society of Photo-optical Instrumentation Engineers and the Northern California Microphotomask/Masking Working Group, in cooperation with National Aeronautics and Space Administration, International Society for Hybrid Microelectronics

Label
Developments in semiconductor microlithography : [seminar] : June 1-3, 1976, San Jose, California
Title
Developments in semiconductor microlithography
Title remainder
[seminar] : June 1-3, 1976, San Jose, California
Statement of responsibility
Donald E. Routh [and others] editors ; presented by the Society of Photo-optical Instrumentation Engineers and the Northern California Microphotomask/Masking Working Group, in cooperation with National Aeronautics and Space Administration, International Society for Hybrid Microelectronics
Contributor
Subject
Genre
Language
eng
Member of
Action
digitized
Cataloging source
OCLCE
Dewey number
686.2/325
Illustrations
illustrations
Index
index present
LC call number
TK7871.85
LC item number
.D49
Literary form
non fiction
Nature of contents
  • dictionaries
  • bibliography
http://library.link/vocab/relatedWorkOrContributorName
  • Routh, Donald E
  • Society of Photo-optical Instrumentation Engineers
  • Northern California Microphotomask/Masking Working Group.
Series statement
Proceedings of the Society of Photo-optical Instrumentation Engineers
Series volume
v. 80
http://library.link/vocab/subjectName
  • Semiconductors
  • Microlithography
Label
Developments in semiconductor microlithography : [seminar] : June 1-3, 1976, San Jose, California, Donald E. Routh [and others] editors ; presented by the Society of Photo-optical Instrumentation Engineers and the Northern California Microphotomask/Masking Working Group, in cooperation with National Aeronautics and Space Administration, International Society for Hybrid Microelectronics
Instantiates
Publication
Antecedent source
file reproduced from original
Bibliography note
Includes bibliographical references and indexes
Carrier category
online resource
Carrier category code
cr
Carrier MARC source
rdacarrier
Color
black and white
Content category
text
Content type code
txt
Content type MARC source
rdacontent
Dimensions
unknown
Extent
1 online resource (vi, 146 pages)
Form of item
online
Isbn
9780892521074
Level of compression
  • lossless
  • lossy
Media category
computer
Media MARC source
rdamedia
Media type code
c
Other physical details
illustrations.
Reformatting quality
  • preservation
  • access
Reproduction note
Electronic reproduction.
Specific material designation
remote
System details
Master and use copy. Digital master created according to Benchmark for Faithful Digital Reproductions of Monographs and Serials, Version 1. Digital Library Federation, December 2002.
Label
Developments in semiconductor microlithography : [seminar] : June 1-3, 1976, San Jose, California, Donald E. Routh [and others] editors ; presented by the Society of Photo-optical Instrumentation Engineers and the Northern California Microphotomask/Masking Working Group, in cooperation with National Aeronautics and Space Administration, International Society for Hybrid Microelectronics
Publication
Antecedent source
file reproduced from original
Bibliography note
Includes bibliographical references and indexes
Carrier category
online resource
Carrier category code
cr
Carrier MARC source
rdacarrier
Color
black and white
Content category
text
Content type code
txt
Content type MARC source
rdacontent
Dimensions
unknown
Extent
1 online resource (vi, 146 pages)
Form of item
online
Isbn
9780892521074
Level of compression
  • lossless
  • lossy
Media category
computer
Media MARC source
rdamedia
Media type code
c
Other physical details
illustrations.
Reformatting quality
  • preservation
  • access
Reproduction note
Electronic reproduction.
Specific material designation
remote
System details
Master and use copy. Digital master created according to Benchmark for Faithful Digital Reproductions of Monographs and Serials, Version 1. Digital Library Federation, December 2002.

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