The Resource Emerging lithographic technologies II : 23-25 February 1998, Santa Clara, California, Yuli Vladimirsky, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, SEMATECH, (electronic book)

Emerging lithographic technologies II : 23-25 February 1998, Santa Clara, California, Yuli Vladimirsky, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, SEMATECH, (electronic book)

Label
Emerging lithographic technologies II : 23-25 February 1998, Santa Clara, California
Title
Emerging lithographic technologies II
Title remainder
23-25 February 1998, Santa Clara, California
Statement of responsibility
Yuli Vladimirsky, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, SEMATECH
Title variation
  • Emerging lithographic technologies 2
  • Emerging lithographic technologies two
Contributor
Subject
Genre
Language
eng
Member of
Cataloging source
SPIED
Illustrations
illustrations
Index
index present
Literary form
non fiction
Nature of contents
  • dictionaries
  • bibliography
http://library.link/vocab/relatedWorkOrContributorName
  • Vladimirsky, Yuli
  • Society of Photo-optical Instrumentation Engineers
  • Semiconductor Equipment and Materials International.
  • SEMATECH (Organization)
  • SPIE Digital Library
Series statement
Proceedings of SPIE,
Series volume
3331
http://library.link/vocab/subjectName
  • Lithography, Electron beam
  • Microlithography
  • X-ray lithography
  • X-rays
  • Masks (Electronics)
Label
Emerging lithographic technologies II : 23-25 February 1998, Santa Clara, California, Yuli Vladimirsky, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, SEMATECH, (electronic book)
Instantiates
Publication
Bibliography note
Includes bibliographical references and index
Dimensions
28 cm.
Dimensions
unknown
Extent
xiii, 702 p.
Form of item
electronic
Other physical details
ill.
Reproduction note
Electronic resource.
Specific material designation
remote
Label
Emerging lithographic technologies II : 23-25 February 1998, Santa Clara, California, Yuli Vladimirsky, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, SEMATECH, (electronic book)
Publication
Bibliography note
Includes bibliographical references and index
Dimensions
28 cm.
Dimensions
unknown
Extent
xiii, 702 p.
Form of item
electronic
Other physical details
ill.
Reproduction note
Electronic resource.
Specific material designation
remote

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