The Resource Emerging lithographic technologies IV : 28 February-1 March, 2000, Santa Clara, [California], USA, Elizabeth A. Dobisz, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH, (electronic book)
Emerging lithographic technologies IV : 28 February-1 March, 2000, Santa Clara, [California], USA, Elizabeth A. Dobisz, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH, (electronic book)
Resource Information
The item Emerging lithographic technologies IV : 28 February-1 March, 2000, Santa Clara, [California], USA, Elizabeth A. Dobisz, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH, (electronic book) represents a specific, individual, material embodiment of a distinct intellectual or artistic creation found in University of Liverpool.This item is available to borrow from 1 library branch.
Resource Information
The item Emerging lithographic technologies IV : 28 February-1 March, 2000, Santa Clara, [California], USA, Elizabeth A. Dobisz, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH, (electronic book) represents a specific, individual, material embodiment of a distinct intellectual or artistic creation found in University of Liverpool.
This item is available to borrow from 1 library branch.
- Label
- Emerging lithographic technologies IV : 28 February-1 March, 2000, Santa Clara, [California], USA
- Title
- Emerging lithographic technologies IV
- Title remainder
- 28 February-1 March, 2000, Santa Clara, [California], USA
- Statement of responsibility
- Elizabeth A. Dobisz, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH
- Language
- eng
- Cataloging source
- SPIED
- Illustrations
- illustrations
- Index
- index present
- Literary form
- non fiction
- Nature of contents
-
- dictionaries
- bibliography
- http://library.link/vocab/relatedWorkOrContributorName
-
- Dobisz, Elizabeth A.
- Society of Photo-optical Instrumentation Engineers
- Semiconductor Equipment and Materials International
- International SEMATECH
- SPIE Digital Library
- Series statement
- Proceedings of SPIE
- Series volume
- 3997
- http://library.link/vocab/subjectName
-
- Lithography, Electron beam
- Microlithography
- X-ray lithography
- X-rays
- Masks (Electronics)
- Label
- Emerging lithographic technologies IV : 28 February-1 March, 2000, Santa Clara, [California], USA, Elizabeth A. Dobisz, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH, (electronic book)
- Bibliography note
- Includes bibliographical references and author index
- Carrier category
- online resource
- Carrier category code
-
- cr
- Carrier MARC source
- rdacarrier
- Content category
- text
- Content type code
-
- txt
- Content type MARC source
- rdacontent
- Dimensions
- 28 cm.
- Dimensions
- unknown
- Extent
- xv, 900 p.
- Form of item
- electronic
- Media category
- computer
- Media MARC source
- rdamedia
- Media type code
-
- c
- Other physical details
- ill.
- Reproduction note
- Electronic resource.
- Specific material designation
- remote
- Label
- Emerging lithographic technologies IV : 28 February-1 March, 2000, Santa Clara, [California], USA, Elizabeth A. Dobisz, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH, (electronic book)
- Bibliography note
- Includes bibliographical references and author index
- Carrier category
- online resource
- Carrier category code
-
- cr
- Carrier MARC source
- rdacarrier
- Content category
- text
- Content type code
-
- txt
- Content type MARC source
- rdacontent
- Dimensions
- 28 cm.
- Dimensions
- unknown
- Extent
- xv, 900 p.
- Form of item
- electronic
- Media category
- computer
- Media MARC source
- rdamedia
- Media type code
-
- c
- Other physical details
- ill.
- Reproduction note
- Electronic resource.
- Specific material designation
- remote
Subject
- Lithography, Electron beam -- Congresses
- Masks (Electronics) -- Congresses
- Microlithography -- Industrial applications -- Congresses
- X-ray lithography -- Congresses
- X-rays -- Industrial applications -- Congresses
Genre
Member of
- Proceedings of SPIE--the International Society for Optical Engineering, 3997
- Online access with subscription: SPIE digital library
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Data Citation of the Item Emerging lithographic technologies IV : 28 February-1 March, 2000, Santa Clara, [California], USA, Elizabeth A. Dobisz, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH, (electronic book)
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<div class="citation" vocab="http://schema.org/"><i class="fa fa-external-link-square fa-fw"></i> Data from <span resource="http://link.liverpool.ac.uk/portal/Emerging-lithographic-technologies-IV--28/PYrKyn9OTlE/" typeof="Book http://bibfra.me/vocab/lite/Item"><span property="name http://bibfra.me/vocab/lite/label"><a href="http://link.liverpool.ac.uk/portal/Emerging-lithographic-technologies-IV--28/PYrKyn9OTlE/">Emerging lithographic technologies IV : 28 February-1 March, 2000, Santa Clara, [California], USA, Elizabeth A. Dobisz, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH, (electronic book)</a></span> - <span property="potentialAction" typeOf="OrganizeAction"><span property="agent" typeof="LibrarySystem http://library.link/vocab/LibrarySystem" resource="http://link.liverpool.ac.uk/"><span property="name http://bibfra.me/vocab/lite/label"><a property="url" href="http://link.liverpool.ac.uk/">University of Liverpool</a></span></span></span></span></div>
