The Resource Emerging lithographic technologies IX : 1-3 March 2005, San Jose, California, USA, R. Scott Mackay, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, International SEMATECH, (electronic book)

Emerging lithographic technologies IX : 1-3 March 2005, San Jose, California, USA, R. Scott Mackay, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, International SEMATECH, (electronic book)

Label
Emerging lithographic technologies IX : 1-3 March 2005, San Jose, California, USA
Title
Emerging lithographic technologies IX
Title remainder
1-3 March 2005, San Jose, California, USA
Statement of responsibility
R. Scott Mackay, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, International SEMATECH
Contributor
Subject
Genre
Language
eng
Member of
Cataloging source
NHM
Dewey number
621.3815/31
Illustrations
illustrations
Index
index present
LC call number
TK7874
LC item number
.E5269 2005
Literary form
non fiction
Nature of contents
  • dictionaries
  • bibliography
http://library.link/vocab/relatedWorkOrContributorDate
1961-
http://library.link/vocab/relatedWorkOrContributorName
  • Mackay, R. Scott
  • Society of Photo-optical Instrumentation Engineers
  • International SEMATECH.
Series statement
Proceedings of SPIE,
Series volume
5751
http://library.link/vocab/subjectName
  • Lithography, Electron beam
  • Microlithography
  • X-ray lithography
  • X-rays
  • Masks (Electronics)
Label
Emerging lithographic technologies IX : 1-3 March 2005, San Jose, California, USA, R. Scott Mackay, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, International SEMATECH, (electronic book)
Instantiates
Publication
Bibliography note
Includes bibliographical references and author index
Color
multicolored
Dimensions
28 cm.
Dimensions
unknown
Extent
2 v. (xviii, 1244 p.)
Form of item
electronic
Other physical details
ill. (some col.)
Reproduction note
Electronic resource.
Specific material designation
remote
Label
Emerging lithographic technologies IX : 1-3 March 2005, San Jose, California, USA, R. Scott Mackay, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, International SEMATECH, (electronic book)
Publication
Bibliography note
Includes bibliographical references and author index
Color
multicolored
Dimensions
28 cm.
Dimensions
unknown
Extent
2 v. (xviii, 1244 p.)
Form of item
electronic
Other physical details
ill. (some col.)
Reproduction note
Electronic resource.
Specific material designation
remote

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