The Resource Emerging lithographic technologies V : 27 February-1 March, 2001, Santa Clara, [California], USA, Elizabeth A. Dobisz, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH, (electronic book)

Emerging lithographic technologies V : 27 February-1 March, 2001, Santa Clara, [California], USA, Elizabeth A. Dobisz, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH, (electronic book)

Label
Emerging lithographic technologies V : 27 February-1 March, 2001, Santa Clara, [California], USA
Title
Emerging lithographic technologies V
Title remainder
27 February-1 March, 2001, Santa Clara, [California], USA
Statement of responsibility
Elizabeth A. Dobisz, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH
Contributor
Subject
Genre
Language
eng
Member of
Cataloging source
SPIED
Illustrations
illustrations
Index
index present
Literary form
non fiction
Nature of contents
  • dictionaries
  • bibliography
http://library.link/vocab/relatedWorkOrContributorName
  • Dobisz, Elizabeth A.
  • Society of Photo-optical Instrumentation Engineers
  • Semiconductor Equipment and Materials International.
  • International SEMATECH.
Series statement
Proceedings of SPIE
Series volume
4343
http://library.link/vocab/subjectName
  • Lithography, Electron beam
  • Microlithography
  • X-ray lithography
  • X-rays
  • Masks (Electronics)
Label
Emerging lithographic technologies V : 27 February-1 March, 2001, Santa Clara, [California], USA, Elizabeth A. Dobisz, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH, (electronic book)
Instantiates
Publication
Bibliography note
Includes bibliographical references and author index
Dimensions
28 cm.
Dimensions
unknown
Extent
xv, 818 p.
Form of item
electronic
Other physical details
ill. (some col.)
Reproduction note
Electronic resource.
Specific material designation
remote
Label
Emerging lithographic technologies V : 27 February-1 March, 2001, Santa Clara, [California], USA, Elizabeth A. Dobisz, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH, (electronic book)
Publication
Bibliography note
Includes bibliographical references and author index
Dimensions
28 cm.
Dimensions
unknown
Extent
xv, 818 p.
Form of item
electronic
Other physical details
ill. (some col.)
Reproduction note
Electronic resource.
Specific material designation
remote

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