The Resource Emerging lithographic technologies VIII : 24-26 February 2004, Santa Clara, California, USA, R. Scott Mackay, chair/editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, [and] International SEMATECH, (electronic book)

Emerging lithographic technologies VIII : 24-26 February 2004, Santa Clara, California, USA, R. Scott Mackay, chair/editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, [and] International SEMATECH, (electronic book)

Label
Emerging lithographic technologies VIII : 24-26 February 2004, Santa Clara, California, USA
Title
Emerging lithographic technologies VIII
Title remainder
24-26 February 2004, Santa Clara, California, USA
Statement of responsibility
R. Scott Mackay, chair/editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, [and] International SEMATECH
Title variation
  • Emerging lithographic technologies 8
  • Emerging lithographic technologies eight
Contributor
Editor
Editor
Subject
Genre
Language
eng
Member of
Cataloging source
NHM
Illustrations
illustrations
Index
index present
Literary form
non fiction
Nature of contents
  • dictionaries
  • bibliography
http://library.link/vocab/relatedWorkOrContributorName
  • Mackay, R. Scott
  • Society of Photo-optical Instrumentation Engineers
  • Semiconductor Equipment and Materials International.
  • International SEMATECH.
Series statement
Proceedings of SPIE,
Series volume
5374
http://library.link/vocab/subjectName
  • Lithography, Electron beam
  • Microlithography
  • X-ray lithography
  • X-rays
  • Masks (Electronics)
Label
Emerging lithographic technologies VIII : 24-26 February 2004, Santa Clara, California, USA, R. Scott Mackay, chair/editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, [and] International SEMATECH, (electronic book)
Instantiates
Publication
Bibliography note
Includes bibliographical references and index
Color
multicolored
Dimensions
28 cm.
Dimensions
unknown
Extent
2 v. (xxxviii, 1110 p.)
Form of item
electronic
Other physical details
ill.
Reproduction note
Electronic resource.
Specific material designation
remote
Label
Emerging lithographic technologies VIII : 24-26 February 2004, Santa Clara, California, USA, R. Scott Mackay, chair/editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, [and] International SEMATECH, (electronic book)
Publication
Bibliography note
Includes bibliographical references and index
Color
multicolored
Dimensions
28 cm.
Dimensions
unknown
Extent
2 v. (xxxviii, 1110 p.)
Form of item
electronic
Other physical details
ill.
Reproduction note
Electronic resource.
Specific material designation
remote

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