The Resource Emerging lithographic technologies X : 21-23 February, 2006, San Jose, California, USA, Michael J. Lercel, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMATECH, Inc (USA), (electronic book)

Emerging lithographic technologies X : 21-23 February, 2006, San Jose, California, USA, Michael J. Lercel, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMATECH, Inc (USA), (electronic book)

Label
Emerging lithographic technologies X : 21-23 February, 2006, San Jose, California, USA
Title
Emerging lithographic technologies X
Title remainder
21-23 February, 2006, San Jose, California, USA
Statement of responsibility
Michael J. Lercel, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMATECH, Inc (USA)
Contributor
Subject
Genre
Language
eng
Member of
Cataloging source
CSt
Illustrations
illustrations
Index
index present
LC call number
TK7874
LC item number
.E56 2006
Literary form
non fiction
Nature of contents
  • dictionaries
  • bibliography
http://library.link/vocab/relatedWorkOrContributorDate
1969-
http://library.link/vocab/relatedWorkOrContributorName
  • Lercel, Michael J.
  • Society of Photo-optical Instrumentation Engineers
  • International SEMATECH.
Series statement
Proceedings of SPIE,
Series volume
6151
http://library.link/vocab/subjectName
  • Lithography, Electron beam
  • Microlithography
  • X-ray lithography
  • X-rays
  • Masks (Electronics)
Label
Emerging lithographic technologies X : 21-23 February, 2006, San Jose, California, USA, Michael J. Lercel, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMATECH, Inc (USA), (electronic book)
Instantiates
Publication
Bibliography note
Includes bibliographical references and author index
Color
mixed
Dimensions
28 cm.
Dimensions
unknown
Extent
2 v.
Form of item
electronic
Other physical details
ill.
Reproduction note
Electronic resource.
Specific material designation
remote
Label
Emerging lithographic technologies X : 21-23 February, 2006, San Jose, California, USA, Michael J. Lercel, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMATECH, Inc (USA), (electronic book)
Publication
Bibliography note
Includes bibliographical references and author index
Color
mixed
Dimensions
28 cm.
Dimensions
unknown
Extent
2 v.
Form of item
electronic
Other physical details
ill.
Reproduction note
Electronic resource.
Specific material designation
remote

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