Coverart for item
The Resource Emerging lithographic technologies XI : 27 February-1 March 2007, San Jose, California, USA, Michael J. Lercel, editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMATECH, (electronic book)

Emerging lithographic technologies XI : 27 February-1 March 2007, San Jose, California, USA, Michael J. Lercel, editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMATECH, (electronic book)

Label
Emerging lithographic technologies XI : 27 February-1 March 2007, San Jose, California, USA
Title
Emerging lithographic technologies XI
Title remainder
27 February-1 March 2007, San Jose, California, USA
Statement of responsibility
Michael J. Lercel, editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMATECH
Contributor
Subject
Genre
Language
eng
Member of
Cataloging source
AZU
Illustrations
illustrations
Index
index present
Literary form
non fiction
Nature of contents
  • dictionaries
  • bibliography
http://library.link/vocab/relatedWorkOrContributorDate
1969-
http://library.link/vocab/relatedWorkOrContributorName
  • Lercel, Michael J.
  • Society of Photo-optical Instrumentation Engineers
  • International SEMATECH
Series statement
Proceedings of SPIE,
Series volume
6517
http://library.link/vocab/subjectName
  • Lithography, Electron beam
  • Microlithography
  • X-ray lithography
  • X-rays
  • Masks (Electronics)
Label
Emerging lithographic technologies XI : 27 February-1 March 2007, San Jose, California, USA, Michael J. Lercel, editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMATECH, (electronic book)
Instantiates
Publication
Bibliography note
Includes bibliographical references and author index
Color
mixed
Dimensions
28 cm.
Dimensions
unknown
Extent
2 v.
Form of item
electronic
Isbn
9780819466365
Other physical details
ill. (some col.)
Reproduction note
Electronic resource.
Specific material designation
remote
Label
Emerging lithographic technologies XI : 27 February-1 March 2007, San Jose, California, USA, Michael J. Lercel, editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMATECH, (electronic book)
Publication
Bibliography note
Includes bibliographical references and author index
Color
mixed
Dimensions
28 cm.
Dimensions
unknown
Extent
2 v.
Form of item
electronic
Isbn
9780819466365
Other physical details
ill. (some col.)
Reproduction note
Electronic resource.
Specific material designation
remote

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