Borrow it
Coverart for item
The Resource Growth and transport in nanostructured materials : reactive transport in PVD, CVD, and ALD, Angel Yanguas-Gil

Growth and transport in nanostructured materials : reactive transport in PVD, CVD, and ALD, Angel Yanguas-Gil

Creator
Author
Summary
This book will address the application of gas phase thin film methods, including techniques such as evaporation, sputtering, CVD, and ALD to the synthesis of materials on nanostructured and high aspect-ratio high surface area materials. We have chosen to introduce these topics and the different application fields from a chronological perspective: we start with the early concepts of step coverage and later conformality in semiconductor manufacturing, and how later on the range of application branched out to include others such as energy storage, catalysis, and more broadly nanomaterials synthesis. The book will describe the ballistic and continuum descriptions of gas transport on nanostructured materials and then will move on to incorporate the impact of precursor-surface interaction. We will finally conclude approaching the subjects of feature shape evolution and the connection between nano and reactor scales and will briefly present different advanced algorithms that can be used to effectively compute particle transport, in some cases borrowing from other disciplines such as radiative heat transfer. The book gathers in a single place information scattered over thirty years of scientific research, including the most recent results in the field of Atomic Layer Deposition. Besides a mathematical description of the fundamentals of thin film growth in nanostructured materials, it includes analytic expressions and plots that can be used to predict the growth using gas phase synthesis methods in a number of ideal approximations. The focus on the fundamental aspects over particular processes will broaden the appeal and the shelf lifetime of this book. The reader of this book will gain a thorough understanding on the coating of high surface area and nanostructured materials using gas phase thin film deposition methods, including the limitations of each technique. Those coming from the theoretical side will gain the knowledge required to model the growth process, while those readers more interested in the process development will gain the theoretical understanding will be useful for process optimization
Language
eng
Work
Publication
Extent
1 online resource.
Contents
  • Introduction
  • Fundamentals of Gas Phase Transport on Nanostructured Materials
  • Modeling Thin Film Growth on Nanostructured Materials
  • Advanced Concepts
Isbn
9783319246727
Instance
Label
Growth and transport in nanostructured materials : reactive transport in PVD, CVD, and ALD
Title
Growth and transport in nanostructured materials
Title remainder
reactive transport in PVD, CVD, and ALD
Statement of responsibility
Angel Yanguas-Gil
Creator
Author
Subject
Language
eng
Summary
This book will address the application of gas phase thin film methods, including techniques such as evaporation, sputtering, CVD, and ALD to the synthesis of materials on nanostructured and high aspect-ratio high surface area materials. We have chosen to introduce these topics and the different application fields from a chronological perspective: we start with the early concepts of step coverage and later conformality in semiconductor manufacturing, and how later on the range of application branched out to include others such as energy storage, catalysis, and more broadly nanomaterials synthesis. The book will describe the ballistic and continuum descriptions of gas transport on nanostructured materials and then will move on to incorporate the impact of precursor-surface interaction. We will finally conclude approaching the subjects of feature shape evolution and the connection between nano and reactor scales and will briefly present different advanced algorithms that can be used to effectively compute particle transport, in some cases borrowing from other disciplines such as radiative heat transfer. The book gathers in a single place information scattered over thirty years of scientific research, including the most recent results in the field of Atomic Layer Deposition. Besides a mathematical description of the fundamentals of thin film growth in nanostructured materials, it includes analytic expressions and plots that can be used to predict the growth using gas phase synthesis methods in a number of ideal approximations. The focus on the fundamental aspects over particular processes will broaden the appeal and the shelf lifetime of this book. The reader of this book will gain a thorough understanding on the coating of high surface area and nanostructured materials using gas phase thin film deposition methods, including the limitations of each technique. Those coming from the theoretical side will gain the knowledge required to model the growth process, while those readers more interested in the process development will gain the theoretical understanding will be useful for process optimization
Member of
Cataloging source
N$T
http://library.link/vocab/creatorName
Yanguas-Gil, Angel
Dewey number
  • 620.1/15
  • 620.11
Index
index present
LC call number
TA418.9.N35
Literary form
non fiction
Nature of contents
  • dictionaries
  • bibliography
Series statement
SpringerBriefs in materials
http://library.link/vocab/subjectName
  • Nanostructured materials
  • Physical vapor deposition
  • Chemical vapor deposition
  • Materials Science
  • Surfaces and Interfaces, Thin Films
  • Surface and Interface Science, Thin Films
  • Nanochemistry
  • Semiconductors
  • Energy Storage
Label
Growth and transport in nanostructured materials : reactive transport in PVD, CVD, and ALD, Angel Yanguas-Gil
Instantiates
Publication
Copyright
Antecedent source
unknown
Bibliography note
Includes bibliographical references and index
Carrier category
online resource
Carrier category code
  • cr
Carrier MARC source
rdacarrier
Color
multicolored
Content category
text
Content type code
  • txt
Content type MARC source
rdacontent
Contents
Introduction -- Fundamentals of Gas Phase Transport on Nanostructured Materials -- Modeling Thin Film Growth on Nanostructured Materials -- Advanced Concepts
Dimensions
unknown
Extent
1 online resource.
File format
unknown
Form of item
online
Isbn
9783319246727
Level of compression
unknown
Media category
computer
Media MARC source
rdamedia
Media type code
  • c
Other control number
10.1007/978-3-319-24672-7
Quality assurance targets
not applicable
Reformatting quality
unknown
Sound
unknown sound
Specific material designation
remote
System control number
ocn964698605
Label
Growth and transport in nanostructured materials : reactive transport in PVD, CVD, and ALD, Angel Yanguas-Gil
Publication
Copyright
Antecedent source
unknown
Bibliography note
Includes bibliographical references and index
Carrier category
online resource
Carrier category code
  • cr
Carrier MARC source
rdacarrier
Color
multicolored
Content category
text
Content type code
  • txt
Content type MARC source
rdacontent
Contents
Introduction -- Fundamentals of Gas Phase Transport on Nanostructured Materials -- Modeling Thin Film Growth on Nanostructured Materials -- Advanced Concepts
Dimensions
unknown
Extent
1 online resource.
File format
unknown
Form of item
online
Isbn
9783319246727
Level of compression
unknown
Media category
computer
Media MARC source
rdamedia
Media type code
  • c
Other control number
10.1007/978-3-319-24672-7
Quality assurance targets
not applicable
Reformatting quality
unknown
Sound
unknown sound
Specific material designation
remote
System control number
ocn964698605

Subject

Member of

Library Locations

Library Links

Structured data from the Bibframe namespace is licensed under the Creative Commons Attribution 4.0 International License by Sydney Jones Library, University of Liverpool. Additional terms may apply to data associated with third party namespaces.
Processing Feedback ...