Coverart for item
The Resource Handbook of microlithography, micromachining, and microfabrication, Volume 1, Microlithography, P. Rai-Choudhury, editor

Handbook of microlithography, micromachining, and microfabrication, Volume 1, Microlithography, P. Rai-Choudhury, editor

Label
Handbook of microlithography, micromachining, and microfabrication, Volume 1, Microlithography
Title
Handbook of microlithography, micromachining, and microfabrication
Title number
Volume 1
Title part
Microlithography
Statement of responsibility
P. Rai-Choudhury, editor
Title variation
  • Microlithography, micromachining, and microfabrication
  • Microlithography
Contributor
Editor
Publisher
Subject
Language
eng
Summary
The dynamic field of lithography demands an authoritative handbook for process development and production, and to aid in the training of scientists and engineers. It contains process details, recipes, tables, charts, etc., and is useful as a reference book or as a textbook
Member of
Cataloging source
CaBNVSL
Dewey number
670
Illustrations
illustrations
Index
index present
LC call number
TK7836
LC item number
.H3423 1997 v.1eb
Literary form
non fiction
Nature of contents
  • dictionaries
  • bibliography
http://library.link/vocab/relatedWorkOrContributorName
  • Rai-Choudhury, P.
  • Society of Photo-optical Instrumentation Engineers
Series statement
SPIE Press monograph
Series volume
PM39
http://library.link/vocab/subjectName
Microlithography
Target audience
adult
Label
Handbook of microlithography, micromachining, and microfabrication, Volume 1, Microlithography, P. Rai-Choudhury, editor
Instantiates
Publication
Copyright
Bibliography note
Includes bibliographical references and index
Carrier category
online resource
Carrier MARC source
rdacarrier
Color
black and white
Content category
  • text
  • still image
Content type MARC source
  • rdacontent
  • rdacontent
Contents
Preface -- Introduction / Burn J. Lin, P. Rai-Choudhury -- 1. Optical lithography / Harry J. Levinson, William J. Arnold -- 2. Electron beam lithography / Mark A. McCord, Michael J. Rooks -- 3. X-ray lithography / Franco Cerrina -- 4. Deep-UV resist technology / Robert D. Allen, Willard E. Conley, Roderick R. Kunz -- 5. Photomask fabrication procedures and limitations / John G. Skinner, Timothy R. Groves, Anthony Novembre, Hans Pfeiffer, Rajeev Singh -- 6. Metrology methods in photolithography / Laurie J. Lauchlan, Diana Nyyssonen, Neal Sullivan -- 7. Optical lithography modeling / Andrew R. Neureuther, Chris A. Mack -- 8. Issues in nanolithography for quantum effect device manufacture / Martin C. Peckerar, F. Keith Perkins, Elizabeth A. Dobisz, Orest J. Glembocki -- Index
Control code
9781510607965
Dimensions
unknown
Extent
1 online resource (viii, 768 pages)
File format
multiple file formats
Form of item
online
Isbn
9780819497864
Media category
electronic
Media MARC source
isbdmedia
Other control number
10.1117/3.2265070
Other physical details
illustrations.
Reformatting quality
access
Reproduction note
Electronic resource.
Specific material designation
remote
System control number
  • (OCoLC)985337265
  • (CaBNVSL)gtp00567079
System details
System requirements: Adobe Acrobat Reader
Label
Handbook of microlithography, micromachining, and microfabrication, Volume 1, Microlithography, P. Rai-Choudhury, editor
Publication
Copyright
Bibliography note
Includes bibliographical references and index
Carrier category
online resource
Carrier MARC source
rdacarrier
Color
black and white
Content category
  • text
  • still image
Content type MARC source
  • rdacontent
  • rdacontent
Contents
Preface -- Introduction / Burn J. Lin, P. Rai-Choudhury -- 1. Optical lithography / Harry J. Levinson, William J. Arnold -- 2. Electron beam lithography / Mark A. McCord, Michael J. Rooks -- 3. X-ray lithography / Franco Cerrina -- 4. Deep-UV resist technology / Robert D. Allen, Willard E. Conley, Roderick R. Kunz -- 5. Photomask fabrication procedures and limitations / John G. Skinner, Timothy R. Groves, Anthony Novembre, Hans Pfeiffer, Rajeev Singh -- 6. Metrology methods in photolithography / Laurie J. Lauchlan, Diana Nyyssonen, Neal Sullivan -- 7. Optical lithography modeling / Andrew R. Neureuther, Chris A. Mack -- 8. Issues in nanolithography for quantum effect device manufacture / Martin C. Peckerar, F. Keith Perkins, Elizabeth A. Dobisz, Orest J. Glembocki -- Index
Control code
9781510607965
Dimensions
unknown
Extent
1 online resource (viii, 768 pages)
File format
multiple file formats
Form of item
online
Isbn
9780819497864
Media category
electronic
Media MARC source
isbdmedia
Other control number
10.1117/3.2265070
Other physical details
illustrations.
Reformatting quality
access
Reproduction note
Electronic resource.
Specific material designation
remote
System control number
  • (OCoLC)985337265
  • (CaBNVSL)gtp00567079
System details
System requirements: Adobe Acrobat Reader

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