The Resource Integrated circuit metrology, inspection, and process control VIII : 28 February-2 March, San Jose, California, Marylyn Hoy Bennett, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMI--Semiconductor Equipment and Materials International, (electronic book)

Integrated circuit metrology, inspection, and process control VIII : 28 February-2 March, San Jose, California, Marylyn Hoy Bennett, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMI--Semiconductor Equipment and Materials International, (electronic book)

Label
Integrated circuit metrology, inspection, and process control VIII : 28 February-2 March, San Jose, California
Title
Integrated circuit metrology, inspection, and process control VIII
Title remainder
28 February-2 March, San Jose, California
Statement of responsibility
Marylyn Hoy Bennett, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMI--Semiconductor Equipment and Materials International
Contributor
Subject
Genre
Language
eng
Member of
Cataloging source
SPIED
Illustrations
illustrations
Index
index present
Literary form
non fiction
Nature of contents
  • dictionaries
  • bibliography
http://library.link/vocab/relatedWorkOrContributorDate
1994
http://library.link/vocab/relatedWorkOrContributorName
  • Bennett, Marylyn Hoy
  • Society of Photo-optical Instrumentation Engineers
  • Semiconductor Equipment and Materials International
  • SPIE Digital Library
  • SPIE Symposium on Microlithography
Series statement
Proceedings / SPIE--the International Society for Optical Engineering,
Series volume
2196
http://library.link/vocab/subjectName
  • Integrated circuits
  • Integrated circuits
  • Process control
  • Optical measurements
Label
Integrated circuit metrology, inspection, and process control VIII : 28 February-2 March, San Jose, California, Marylyn Hoy Bennett, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMI--Semiconductor Equipment and Materials International, (electronic book)
Instantiates
Publication
Note
"Papers in this conference ... were presented at the SPIE Microlithography Symposium"--P. ix
Bibliography note
Includes bibliographical references and author index
Carrier category
online resource
Carrier category code
  • cr
Carrier MARC source
rdacarrier
Content category
text
Content type code
  • txt
Content type MARC source
rdacontent
Dimensions
28 cm.
Dimensions
unknown
Extent
ix, 553 p.
Form of item
electronic
Media category
computer
Media MARC source
rdamedia
Media type code
  • c
Other physical details
ill.
Reproduction note
Electronic resource.
Specific material designation
remote
Label
Integrated circuit metrology, inspection, and process control VIII : 28 February-2 March, San Jose, California, Marylyn Hoy Bennett, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMI--Semiconductor Equipment and Materials International, (electronic book)
Publication
Note
"Papers in this conference ... were presented at the SPIE Microlithography Symposium"--P. ix
Bibliography note
Includes bibliographical references and author index
Carrier category
online resource
Carrier category code
  • cr
Carrier MARC source
rdacarrier
Content category
text
Content type code
  • txt
Content type MARC source
rdacontent
Dimensions
28 cm.
Dimensions
unknown
Extent
ix, 553 p.
Form of item
electronic
Media category
computer
Media MARC source
rdamedia
Media type code
  • c
Other physical details
ill.
Reproduction note
Electronic resource.
Specific material designation
remote

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