Coverart for item
The Resource Metrology, Inspection, and Process Control for Microlithography XXIX : 23-26 February 2015, San Jose, California, United States, Jason P. Cain, Martha I. Sanchez, editors ; sponsored by SPIE ; cosponsored by NOVA Ltd. (United States) ; published by SPIE

Metrology, Inspection, and Process Control for Microlithography XXIX : 23-26 February 2015, San Jose, California, United States, Jason P. Cain, Martha I. Sanchez, editors ; sponsored by SPIE ; cosponsored by NOVA Ltd. (United States) ; published by SPIE

Label
Metrology, Inspection, and Process Control for Microlithography XXIX : 23-26 February 2015, San Jose, California, United States
Title
Metrology, Inspection, and Process Control for Microlithography XXIX
Title remainder
23-26 February 2015, San Jose, California, United States
Statement of responsibility
Jason P. Cain, Martha I. Sanchez, editors ; sponsored by SPIE ; cosponsored by NOVA Ltd. (United States) ; published by SPIE
Creator
Contributor
Editor
Issuing body
Sponsoring body
Subject
Genre
Language
eng
Summary
'Proceedings of SPIE' presents the original research papers presented at SPIE conferences and other high-quality conferences in the broad-ranging fields of optics and photonics. These books provide prompt access to the latest innovations in research and technology in their respective fields
Member of
Cataloging source
COO
Dewey number
621.381531
Illustrations
illustrations
Index
no index present
LC call number
TK7874
LC item number
.I5554 2015e
Literary form
non fiction
http://bibfra.me/vocab/lite/meetingDate
2015
http://bibfra.me/vocab/lite/meetingName
Metrology, Inspection, and Process Control for Microlithography (Conference)
Nature of contents
  • dictionaries
  • bibliography
http://library.link/vocab/relatedWorkOrContributorName
  • Cain, Jason P.
  • Sanchez, Martha I.
  • SPIE (Society)
Series statement
Proceedings of SPIE,
Series volume
9424
http://library.link/vocab/subjectName
  • Integrated circuits
  • Integrated circuits
  • Microlithography
  • Process control
Label
Metrology, Inspection, and Process Control for Microlithography XXIX : 23-26 February 2015, San Jose, California, United States, Jason P. Cain, Martha I. Sanchez, editors ; sponsored by SPIE ; cosponsored by NOVA Ltd. (United States) ; published by SPIE
Instantiates
Publication
Copyright
Bibliography note
Includes bibliographical references
Carrier category
online resource
Carrier category code
  • cr
Carrier MARC source
rdacarrier
Content category
text
Content type code
  • txt
Content type MARC source
rdacontent
Dimensions
unknown
Extent
1 online resource
Form of item
online
Isbn
9781628415261
Media category
computer
Media MARC source
rdamedia
Media type code
  • c
Other physical details
illustrations (some color).
Specific material designation
remote
Label
Metrology, Inspection, and Process Control for Microlithography XXIX : 23-26 February 2015, San Jose, California, United States, Jason P. Cain, Martha I. Sanchez, editors ; sponsored by SPIE ; cosponsored by NOVA Ltd. (United States) ; published by SPIE
Publication
Copyright
Bibliography note
Includes bibliographical references
Carrier category
online resource
Carrier category code
  • cr
Carrier MARC source
rdacarrier
Content category
text
Content type code
  • txt
Content type MARC source
rdacontent
Dimensions
unknown
Extent
1 online resource
Form of item
online
Isbn
9781628415261
Media category
computer
Media MARC source
rdamedia
Media type code
  • c
Other physical details
illustrations (some color).
Specific material designation
remote

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