The Resource Metrology, Inspection, and Process Control for Microlithography XXIX : 23-26 February 2015, San Jose, California, United States, Jason P. Cain, Martha I. Sanchez, editors ; sponsored by SPIE ; cosponsored by NOVA Ltd. (United States) ; published by SPIE
Metrology, Inspection, and Process Control for Microlithography XXIX : 23-26 February 2015, San Jose, California, United States, Jason P. Cain, Martha I. Sanchez, editors ; sponsored by SPIE ; cosponsored by NOVA Ltd. (United States) ; published by SPIE
Resource Information
The item Metrology, Inspection, and Process Control for Microlithography XXIX : 23-26 February 2015, San Jose, California, United States, Jason P. Cain, Martha I. Sanchez, editors ; sponsored by SPIE ; cosponsored by NOVA Ltd. (United States) ; published by SPIE represents a specific, individual, material embodiment of a distinct intellectual or artistic creation found in University of Liverpool.This item is available to borrow from 1 library branch.
Resource Information
The item Metrology, Inspection, and Process Control for Microlithography XXIX : 23-26 February 2015, San Jose, California, United States, Jason P. Cain, Martha I. Sanchez, editors ; sponsored by SPIE ; cosponsored by NOVA Ltd. (United States) ; published by SPIE represents a specific, individual, material embodiment of a distinct intellectual or artistic creation found in University of Liverpool.
This item is available to borrow from 1 library branch.
- Summary
- 'Proceedings of SPIE' presents the original research papers presented at SPIE conferences and other high-quality conferences in the broad-ranging fields of optics and photonics. These books provide prompt access to the latest innovations in research and technology in their respective fields
- Language
- eng
- Label
- Metrology, Inspection, and Process Control for Microlithography XXIX : 23-26 February 2015, San Jose, California, United States
- Title
- Metrology, Inspection, and Process Control for Microlithography XXIX
- Title remainder
- 23-26 February 2015, San Jose, California, United States
- Statement of responsibility
- Jason P. Cain, Martha I. Sanchez, editors ; sponsored by SPIE ; cosponsored by NOVA Ltd. (United States) ; published by SPIE
- Language
- eng
- Summary
- 'Proceedings of SPIE' presents the original research papers presented at SPIE conferences and other high-quality conferences in the broad-ranging fields of optics and photonics. These books provide prompt access to the latest innovations in research and technology in their respective fields
- Cataloging source
- COO
- Dewey number
- 621.381531
- Illustrations
- illustrations
- Index
- no index present
- LC call number
- TK7874
- LC item number
- .I5554 2015e
- Literary form
- non fiction
- http://bibfra.me/vocab/lite/meetingDate
- 2015
- http://bibfra.me/vocab/lite/meetingName
- Metrology, Inspection, and Process Control for Microlithography (Conference)
- Nature of contents
-
- dictionaries
- bibliography
- http://library.link/vocab/relatedWorkOrContributorName
-
- Cain, Jason P.
- Sanchez, Martha I.
- SPIE (Society)
- Series statement
- Proceedings of SPIE,
- Series volume
- 9424
- http://library.link/vocab/subjectName
-
- Integrated circuits
- Integrated circuits
- Microlithography
- Process control
- Label
- Metrology, Inspection, and Process Control for Microlithography XXIX : 23-26 February 2015, San Jose, California, United States, Jason P. Cain, Martha I. Sanchez, editors ; sponsored by SPIE ; cosponsored by NOVA Ltd. (United States) ; published by SPIE
- Bibliography note
- Includes bibliographical references
- Carrier category
- online resource
- Carrier category code
-
- cr
- Carrier MARC source
- rdacarrier
- Content category
- text
- Content type code
-
- txt
- Content type MARC source
- rdacontent
- Dimensions
- unknown
- Extent
- 1 online resource
- Form of item
- online
- Isbn
- 9781628415261
- Media category
- computer
- Media MARC source
- rdamedia
- Media type code
-
- c
- Other physical details
- illustrations (some color).
- Specific material designation
- remote
- Label
- Metrology, Inspection, and Process Control for Microlithography XXIX : 23-26 February 2015, San Jose, California, United States, Jason P. Cain, Martha I. Sanchez, editors ; sponsored by SPIE ; cosponsored by NOVA Ltd. (United States) ; published by SPIE
- Bibliography note
- Includes bibliographical references
- Carrier category
- online resource
- Carrier category code
-
- cr
- Carrier MARC source
- rdacarrier
- Content category
- text
- Content type code
-
- txt
- Content type MARC source
- rdacontent
- Dimensions
- unknown
- Extent
- 1 online resource
- Form of item
- online
- Isbn
- 9781628415261
- Media category
- computer
- Media MARC source
- rdamedia
- Media type code
-
- c
- Other physical details
- illustrations (some color).
- Specific material designation
- remote
Subject
- Integrated circuits -- Inspection -- Congresses
- Integrated circuits -- Measurement -- Congresses
- Microlithography -- Congresses
- Process control -- Congresses
Genre
Member of
- Proceedings of SPIE--the International Society for Optical Engineering, 9424.
- Online access with subscription: SPIE digital library
- Proceedings of SPIE--the International Society for Optical Engineering, v. 9424.
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<div class="citation" vocab="http://schema.org/"><i class="fa fa-external-link-square fa-fw"></i> Data from <span resource="http://link.liverpool.ac.uk/portal/Metrology-Inspection-and-Process-Control-for/r_M-e90IQow/" typeof="Book http://bibfra.me/vocab/lite/Item"><span property="name http://bibfra.me/vocab/lite/label"><a href="http://link.liverpool.ac.uk/portal/Metrology-Inspection-and-Process-Control-for/r_M-e90IQow/">Metrology, Inspection, and Process Control for Microlithography XXIX : 23-26 February 2015, San Jose, California, United States, Jason P. Cain, Martha I. Sanchez, editors ; sponsored by SPIE ; cosponsored by NOVA Ltd. (United States) ; published by SPIE</a></span> - <span property="potentialAction" typeOf="OrganizeAction"><span property="agent" typeof="LibrarySystem http://library.link/vocab/LibrarySystem" resource="http://link.liverpool.ac.uk/"><span property="name http://bibfra.me/vocab/lite/label"><a property="url" href="http://link.liverpool.ac.uk/">University of Liverpool</a></span></span></span></span></div>
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Data Citation of the Item Metrology, Inspection, and Process Control for Microlithography XXIX : 23-26 February 2015, San Jose, California, United States, Jason P. Cain, Martha I. Sanchez, editors ; sponsored by SPIE ; cosponsored by NOVA Ltd. (United States) ; published by SPIE
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<div class="citation" vocab="http://schema.org/"><i class="fa fa-external-link-square fa-fw"></i> Data from <span resource="http://link.liverpool.ac.uk/portal/Metrology-Inspection-and-Process-Control-for/r_M-e90IQow/" typeof="Book http://bibfra.me/vocab/lite/Item"><span property="name http://bibfra.me/vocab/lite/label"><a href="http://link.liverpool.ac.uk/portal/Metrology-Inspection-and-Process-Control-for/r_M-e90IQow/">Metrology, Inspection, and Process Control for Microlithography XXIX : 23-26 February 2015, San Jose, California, United States, Jason P. Cain, Martha I. Sanchez, editors ; sponsored by SPIE ; cosponsored by NOVA Ltd. (United States) ; published by SPIE</a></span> - <span property="potentialAction" typeOf="OrganizeAction"><span property="agent" typeof="LibrarySystem http://library.link/vocab/LibrarySystem" resource="http://link.liverpool.ac.uk/"><span property="name http://bibfra.me/vocab/lite/label"><a property="url" href="http://link.liverpool.ac.uk/">University of Liverpool</a></span></span></span></span></div>
