Coverart for item
The Resource Metrology, inspection, and process control for microlithography XXIII : 23-26 February 2009, San Jose, California, United States, John A. Allgair, Christopher J. Raymond, editors ; sponsored by SPIE ; cooperating organization, SEMATECH Inc. (United States)

Metrology, inspection, and process control for microlithography XXIII : 23-26 February 2009, San Jose, California, United States, John A. Allgair, Christopher J. Raymond, editors ; sponsored by SPIE ; cooperating organization, SEMATECH Inc. (United States)

Label
Metrology, inspection, and process control for microlithography XXIII : 23-26 February 2009, San Jose, California, United States
Title
Metrology, inspection, and process control for microlithography XXIII
Title remainder
23-26 February 2009, San Jose, California, United States
Statement of responsibility
John A. Allgair, Christopher J. Raymond, editors ; sponsored by SPIE ; cooperating organization, SEMATECH Inc. (United States)
Contributor
Subject
Genre
Language
eng
Member of
Additional physical form
Also available in print.
Cataloging source
NHM
http://bibfra.me/vocab/lite/collectionName
SPIE digital library
Dewey number
621.3815/48
Illustrations
illustrations
Index
no index present
LC call number
TK7874
LC item number
.I5554 2009e
Literary form
non fiction
Nature of contents
  • dictionaries
  • bibliography
http://library.link/vocab/relatedWorkOrContributorName
  • Allgair, John A.
  • Raymond, Christopher J
  • SPIE (Society)
Series statement
Proceedings of SPIE,
Series volume
7272
http://library.link/vocab/subjectName
  • Integrated circuits
  • Integrated circuits
  • Microlithography
  • Process control
Label
Metrology, inspection, and process control for microlithography XXIII : 23-26 February 2009, San Jose, California, United States, John A. Allgair, Christopher J. Raymond, editors ; sponsored by SPIE ; cooperating organization, SEMATECH Inc. (United States)
Instantiates
Publication
Note
  • Title from title screen (viewed Apr. 8, 2009)
  • Access restricted to SPIE Digital Library subscribers
Antecedent source
unknown
Bibliography note
Includes bibliographical references
Carrier category
online resource
Carrier category code
  • cr
Carrier MARC source
rdacarrier
Color
multicolored
Content category
text
Content type code
  • txt
Content type MARC source
rdacontent
Dimensions
unknown
Extent
1 electronic text (PDF)
File format
unknown
Form of item
online
Isbn
9780819475251
Level of compression
unknown
Media category
computer
Media MARC source
rdamedia
Media type code
  • c
Other physical details
illustrations (some color).
Quality assurance targets
unknown
Reformatting quality
unknown
Sound
unknown sound
Specific material designation
remote
System details
Mode of access: World Wide Web
Label
Metrology, inspection, and process control for microlithography XXIII : 23-26 February 2009, San Jose, California, United States, John A. Allgair, Christopher J. Raymond, editors ; sponsored by SPIE ; cooperating organization, SEMATECH Inc. (United States)
Publication
Note
  • Title from title screen (viewed Apr. 8, 2009)
  • Access restricted to SPIE Digital Library subscribers
Antecedent source
unknown
Bibliography note
Includes bibliographical references
Carrier category
online resource
Carrier category code
  • cr
Carrier MARC source
rdacarrier
Color
multicolored
Content category
text
Content type code
  • txt
Content type MARC source
rdacontent
Dimensions
unknown
Extent
1 electronic text (PDF)
File format
unknown
Form of item
online
Isbn
9780819475251
Level of compression
unknown
Media category
computer
Media MARC source
rdamedia
Media type code
  • c
Other physical details
illustrations (some color).
Quality assurance targets
unknown
Reformatting quality
unknown
Sound
unknown sound
Specific material designation
remote
System details
Mode of access: World Wide Web

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