The Resource Metrology, inspection, and process control for microlithography XV : 26 February-1 March, 2001, Santa Clara, [California] USA, Neal T. Sullivan, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International ; International SEMATECH, (electronic book)

Metrology, inspection, and process control for microlithography XV : 26 February-1 March, 2001, Santa Clara, [California] USA, Neal T. Sullivan, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International ; International SEMATECH, (electronic book)

Label
Metrology, inspection, and process control for microlithography XV : 26 February-1 March, 2001, Santa Clara, [California] USA
Title
Metrology, inspection, and process control for microlithography XV
Title remainder
26 February-1 March, 2001, Santa Clara, [California] USA
Statement of responsibility
Neal T. Sullivan, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International ; International SEMATECH
Contributor
Subject
Genre
Language
eng
Member of
Cataloging source
SPIED
Illustrations
illustrations
Index
index present
Literary form
non fiction
Nature of contents
  • dictionaries
  • bibliography
http://library.link/vocab/relatedWorkOrContributorName
  • Sullivan, Neal T
  • Society of Photo-optical Instrumentation Engineers
  • Semiconductor Equipment and Materials International.
  • International SEMATECH.
  • SPIE Digital Library
Series statement
SPIE proceedings series
Series volume
4344
http://library.link/vocab/subjectName
  • Integrated circuits
  • Integrated circuits
  • Microlithography
  • Process control
Label
Metrology, inspection, and process control for microlithography XV : 26 February-1 March, 2001, Santa Clara, [California] USA, Neal T. Sullivan, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International ; International SEMATECH, (electronic book)
Instantiates
Publication
Bibliography note
Includes bibliographical references and author index
Dimensions
28 cm.
Dimensions
unknown
Extent
xxv, 876 p.
Form of item
electronic
Other physical details
ill.
Reproduction note
Electronic resource.
Specific material designation
remote
Label
Metrology, inspection, and process control for microlithography XV : 26 February-1 March, 2001, Santa Clara, [California] USA, Neal T. Sullivan, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International ; International SEMATECH, (electronic book)
Publication
Bibliography note
Includes bibliographical references and author index
Dimensions
28 cm.
Dimensions
unknown
Extent
xxv, 876 p.
Form of item
electronic
Other physical details
ill.
Reproduction note
Electronic resource.
Specific material designation
remote

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