Coverart for item
The Resource Metrology, inspection, and process control for microlithography XXI : 26 February- 1 March 2007, San Jose, California, USA, Chas N. Archie, editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMATECH (USA), (electronic book)

Metrology, inspection, and process control for microlithography XXI : 26 February- 1 March 2007, San Jose, California, USA, Chas N. Archie, editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMATECH (USA), (electronic book)

Label
Metrology, inspection, and process control for microlithography XXI : 26 February- 1 March 2007, San Jose, California, USA
Title
Metrology, inspection, and process control for microlithography XXI
Title remainder
26 February- 1 March 2007, San Jose, California, USA
Statement of responsibility
Chas N. Archie, editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMATECH (USA)
Contributor
Subject
Genre
Language
eng
Member of
Cataloging source
NHM
Illustrations
illustrations
Index
index present
LC call number
TK7874
LC item number
.I5554 2007e
Literary form
non fiction
Nature of contents
  • dictionaries
  • bibliography
http://library.link/vocab/relatedWorkOrContributorName
  • Archie, Chas N
  • Society of Photo-optical Instrumentation Engineers
  • International SEMATECH
Series statement
Proceedings of SPIE,
Series volume
6518
http://library.link/vocab/subjectName
  • Integrated circuits
  • Integrated circuits
  • Microlithography
  • Process control
Label
Metrology, inspection, and process control for microlithography XXI : 26 February- 1 March 2007, San Jose, California, USA, Chas N. Archie, editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMATECH (USA), (electronic book)
Instantiates
Publication
Antecedent source
unknown
Bibliography note
Includes bibliographical references and author index
Carrier category
online resource
Carrier category code
  • cr
Carrier MARC source
rdacarrier
Color
multicolored
Content category
text
Content type code
  • txt
Content type MARC source
rdacontent
Dimensions
28 cm.
Dimensions
unknown
Extent
3 v.
File format
unknown
Form of item
electronic
Isbn
9780819466372
Level of compression
unknown
Media category
computer
Media MARC source
rdamedia
Media type code
  • c
Other physical details
ill. (chiefly col.)
Quality assurance targets
unknown
Reformatting quality
unknown
Reproduction note
Electronic resource.
Sound
unknown sound
Specific material designation
remote
Label
Metrology, inspection, and process control for microlithography XXI : 26 February- 1 March 2007, San Jose, California, USA, Chas N. Archie, editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMATECH (USA), (electronic book)
Publication
Antecedent source
unknown
Bibliography note
Includes bibliographical references and author index
Carrier category
online resource
Carrier category code
  • cr
Carrier MARC source
rdacarrier
Color
multicolored
Content category
text
Content type code
  • txt
Content type MARC source
rdacontent
Dimensions
28 cm.
Dimensions
unknown
Extent
3 v.
File format
unknown
Form of item
electronic
Isbn
9780819466372
Level of compression
unknown
Media category
computer
Media MARC source
rdamedia
Media type code
  • c
Other physical details
ill. (chiefly col.)
Quality assurance targets
unknown
Reformatting quality
unknown
Reproduction note
Electronic resource.
Sound
unknown sound
Specific material designation
remote

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