Coverart for item
The Resource Metrology, inspection, and process control for microlithography XXVII : 25-28 February 2013, San Jose, California, United States, Alexander Starikov, Jason P. Cain, editors ; sponsored by SPIE ; cosponsored by NOVA Measuring Instruments, Inc. (United States)

Metrology, inspection, and process control for microlithography XXVII : 25-28 February 2013, San Jose, California, United States, Alexander Starikov, Jason P. Cain, editors ; sponsored by SPIE ; cosponsored by NOVA Measuring Instruments, Inc. (United States)

Label
Metrology, inspection, and process control for microlithography XXVII : 25-28 February 2013, San Jose, California, United States
Title
Metrology, inspection, and process control for microlithography XXVII
Title remainder
25-28 February 2013, San Jose, California, United States
Statement of responsibility
Alexander Starikov, Jason P. Cain, editors ; sponsored by SPIE ; cosponsored by NOVA Measuring Instruments, Inc. (United States)
Contributor
Editor
Subject
Genre
Language
eng
Summary
Proceedings of SPIE offer access to the latest innovations in research and technology and are among the most cited references in patent literature
Member of
Cataloging source
COO
Illustrations
illustrations
Index
no index present
LC call number
TK7874
LC item number
.I5554 2013e
Literary form
non fiction
Nature of contents
  • dictionaries
  • bibliography
http://library.link/vocab/relatedWorkOrContributorDate
1952-
http://library.link/vocab/relatedWorkOrContributorName
  • Starikov, Alexander
  • Cain, Jason P.
  • SPIE (Society)
Series statement
Proceedings of SPIE,
Series volume
8681
http://library.link/vocab/subjectName
  • Integrated circuits
  • Integrated circuits
  • Microlithography
  • Process control
Label
Metrology, inspection, and process control for microlithography XXVII : 25-28 February 2013, San Jose, California, United States, Alexander Starikov, Jason P. Cain, editors ; sponsored by SPIE ; cosponsored by NOVA Measuring Instruments, Inc. (United States)
Instantiates
Publication
Copyright
Bibliography note
Includes bibliographical references
Carrier category
online resource
Carrier category code
  • cr
Carrier MARC source
rdacarrier
Content category
text
Content type code
  • txt
Content type MARC source
rdacontent
Dimensions
unknown
Extent
1 online resource
Form of item
online
Isbn
9780819494634
Media category
computer
Media MARC source
rdamedia
Media type code
  • c
Other physical details
illustrations (some color).
Specific material designation
remote
Label
Metrology, inspection, and process control for microlithography XXVII : 25-28 February 2013, San Jose, California, United States, Alexander Starikov, Jason P. Cain, editors ; sponsored by SPIE ; cosponsored by NOVA Measuring Instruments, Inc. (United States)
Publication
Copyright
Bibliography note
Includes bibliographical references
Carrier category
online resource
Carrier category code
  • cr
Carrier MARC source
rdacarrier
Content category
text
Content type code
  • txt
Content type MARC source
rdacontent
Dimensions
unknown
Extent
1 online resource
Form of item
online
Isbn
9780819494634
Media category
computer
Media MARC source
rdamedia
Media type code
  • c
Other physical details
illustrations (some color).
Specific material designation
remote

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