The Resource Metrology, inspection, and process control for microlithography XX : 20-23 February 2006, San Jose, California, USA, Chas N. Archie, chair/editor ; cooperating organization, I SEMATECH ; sponsored and published by SPIE--the International Society for Optical Engineering, (electronic book)

Metrology, inspection, and process control for microlithography XX : 20-23 February 2006, San Jose, California, USA, Chas N. Archie, chair/editor ; cooperating organization, I SEMATECH ; sponsored and published by SPIE--the International Society for Optical Engineering, (electronic book)

Label
Metrology, inspection, and process control for microlithography XX : 20-23 February 2006, San Jose, California, USA
Title
Metrology, inspection, and process control for microlithography XX
Title remainder
20-23 February 2006, San Jose, California, USA
Statement of responsibility
Chas N. Archie, chair/editor ; cooperating organization, I SEMATECH ; sponsored and published by SPIE--the International Society for Optical Engineering
Contributor
Subject
Genre
Language
eng
Member of
Cataloging source
CSt
Illustrations
illustrations
Index
index present
LC call number
TK7874
Literary form
non fiction
Nature of contents
  • dictionaries
  • bibliography
http://library.link/vocab/relatedWorkOrContributorName
  • Archie, Chas N
  • International SEMATECH
Series statement
Proceedings of SPIE,
Series volume
6152
http://library.link/vocab/subjectName
  • Integrated circuits
  • Integrated circuits
  • Microlithography
  • Process control
Label
Metrology, inspection, and process control for microlithography XX : 20-23 February 2006, San Jose, California, USA, Chas N. Archie, chair/editor ; cooperating organization, I SEMATECH ; sponsored and published by SPIE--the International Society for Optical Engineering, (electronic book)
Instantiates
Publication
Bibliography note
Includes bibliographical references and author index
Carrier category
online resource
Carrier category code
  • cr
Carrier MARC source
rdacarrier
Color
mixed
Content category
text
Content type code
  • txt
Content type MARC source
rdacontent
Dimensions
28 cm.
Dimensions
unknown
Extent
2 v. (various pagings)
Form of item
electronic
Media category
computer
Media MARC source
rdamedia
Media type code
  • c
Other physical details
ill.
Reproduction note
Electronic resource.
Specific material designation
remote
Label
Metrology, inspection, and process control for microlithography XX : 20-23 February 2006, San Jose, California, USA, Chas N. Archie, chair/editor ; cooperating organization, I SEMATECH ; sponsored and published by SPIE--the International Society for Optical Engineering, (electronic book)
Publication
Bibliography note
Includes bibliographical references and author index
Carrier category
online resource
Carrier category code
  • cr
Carrier MARC source
rdacarrier
Color
mixed
Content category
text
Content type code
  • txt
Content type MARC source
rdacontent
Dimensions
28 cm.
Dimensions
unknown
Extent
2 v. (various pagings)
Form of item
electronic
Media category
computer
Media MARC source
rdamedia
Media type code
  • c
Other physical details
ill.
Reproduction note
Electronic resource.
Specific material designation
remote

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