The Resource Metrology, inspection, and process control for microlithography XVI : 4-7 March, 2002, Santa Clara, [California] USA, Daniel J.C. Herr, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International ; International SEMATECH, (electronic book)

Metrology, inspection, and process control for microlithography XVI : 4-7 March, 2002, Santa Clara, [California] USA, Daniel J.C. Herr, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International ; International SEMATECH, (electronic book)

Label
Metrology, inspection, and process control for microlithography XVI : 4-7 March, 2002, Santa Clara, [California] USA
Title
Metrology, inspection, and process control for microlithography XVI
Title remainder
4-7 March, 2002, Santa Clara, [California] USA
Statement of responsibility
Daniel J.C. Herr, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International ; International SEMATECH
Contributor
Subject
Genre
Language
eng
Member of
Cataloging source
SPIED
Illustrations
illustrations
Index
index present
Literary form
non fiction
Nature of contents
  • dictionaries
  • bibliography
http://library.link/vocab/relatedWorkOrContributorName
  • Herr, Daniel J. C.
  • Society of Photo-optical Instrumentation Engineers
  • Semiconductor Equipment and Materials International.
  • International SEMATECH.
Series statement
SPIE proceedings series
Series volume
4689
http://library.link/vocab/subjectName
  • Integrated circuits
  • Integrated circuits
  • Microlithography
  • Process control
Label
Metrology, inspection, and process control for microlithography XVI : 4-7 March, 2002, Santa Clara, [California] USA, Daniel J.C. Herr, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International ; International SEMATECH, (electronic book)
Instantiates
Publication
Bibliography note
Includes bibliographical references and author index
Dimensions
28 cm.
Dimensions
unknown
Extent
2 v. (xl, 1204 p.)
Form of item
electronic
Other physical details
ill. (some col.)
Reproduction note
Electronic resource.
Specific material designation
remote
Label
Metrology, inspection, and process control for microlithography XVI : 4-7 March, 2002, Santa Clara, [California] USA, Daniel J.C. Herr, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International ; International SEMATECH, (electronic book)
Publication
Bibliography note
Includes bibliographical references and author index
Dimensions
28 cm.
Dimensions
unknown
Extent
2 v. (xl, 1204 p.)
Form of item
electronic
Other physical details
ill. (some col.)
Reproduction note
Electronic resource.
Specific material designation
remote

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