Coverart for item
The Resource Metrology, inspection, and process control for microlithography XXIV : 22-25 February 2010, San Jose, California, United States, Christopher J. Raymond, editor ; sponsored by SPIE ; cosponsored by Nova Measuring Instruments Ltd. (Israel) ; cooperating organization, SEMATECH Inc. (United States)

Metrology, inspection, and process control for microlithography XXIV : 22-25 February 2010, San Jose, California, United States, Christopher J. Raymond, editor ; sponsored by SPIE ; cosponsored by Nova Measuring Instruments Ltd. (Israel) ; cooperating organization, SEMATECH Inc. (United States)

Label
Metrology, inspection, and process control for microlithography XXIV : 22-25 February 2010, San Jose, California, United States
Title
Metrology, inspection, and process control for microlithography XXIV
Title remainder
22-25 February 2010, San Jose, California, United States
Statement of responsibility
Christopher J. Raymond, editor ; sponsored by SPIE ; cosponsored by Nova Measuring Instruments Ltd. (Israel) ; cooperating organization, SEMATECH Inc. (United States)
Contributor
Subject
Genre
Language
eng
Member of
Cataloging source
NHM
Dewey number
621.3815/48
Illustrations
illustrations
Index
no index present
LC call number
TK7874
LC item number
.I5554 2010e
Literary form
non fiction
Nature of contents
  • dictionaries
  • bibliography
http://library.link/vocab/relatedWorkOrContributorName
  • Raymond, Christopher J
  • SPIE (Society)
  • Nova Measuring Instruments (Firm)
  • SEMATECH (Organization)
Series statement
Proceedings of SPIE,
Series volume
7638
http://library.link/vocab/subjectName
  • Integrated circuits
  • Integrated circuits
  • Microlithography
  • Process control
Label
Metrology, inspection, and process control for microlithography XXIV : 22-25 February 2010, San Jose, California, United States, Christopher J. Raymond, editor ; sponsored by SPIE ; cosponsored by Nova Measuring Instruments Ltd. (Israel) ; cooperating organization, SEMATECH Inc. (United States)
Instantiates
Publication
Note
Title from PDF title screen (SPIE digital library, viewed May 5, 2010)
Bibliography note
Includes bibliographical references
Carrier category
online resource
Carrier category code
  • cr
Carrier MARC source
rdacarrier
Content category
text
Content type code
  • txt
Content type MARC source
rdacontent
Dimensions
unknown
Extent
1 online resource
Form of item
online
Isbn
9780819480521
Media category
computer
Media MARC source
rdamedia
Media type code
  • c
Other physical details
illustrations (some color).
Specific material designation
remote
Label
Metrology, inspection, and process control for microlithography XXIV : 22-25 February 2010, San Jose, California, United States, Christopher J. Raymond, editor ; sponsored by SPIE ; cosponsored by Nova Measuring Instruments Ltd. (Israel) ; cooperating organization, SEMATECH Inc. (United States)
Publication
Note
Title from PDF title screen (SPIE digital library, viewed May 5, 2010)
Bibliography note
Includes bibliographical references
Carrier category
online resource
Carrier category code
  • cr
Carrier MARC source
rdacarrier
Content category
text
Content type code
  • txt
Content type MARC source
rdacontent
Dimensions
unknown
Extent
1 online resource
Form of item
online
Isbn
9780819480521
Media category
computer
Media MARC source
rdamedia
Media type code
  • c
Other physical details
illustrations (some color).
Specific material designation
remote

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