The Resource Metrology, inspection, and process control for microlithography X : 11-13 March, 1996, Santa Clara, California, sponsored and published by SPIE--the International Society for Optical Engineering ; Susan K. Jones, chair/editor, (electronic book)

Metrology, inspection, and process control for microlithography X : 11-13 March, 1996, Santa Clara, California, sponsored and published by SPIE--the International Society for Optical Engineering ; Susan K. Jones, chair/editor, (electronic book)

Label
Metrology, inspection, and process control for microlithography X : 11-13 March, 1996, Santa Clara, California
Title
Metrology, inspection, and process control for microlithography X
Title remainder
11-13 March, 1996, Santa Clara, California
Statement of responsibility
sponsored and published by SPIE--the International Society for Optical Engineering ; Susan K. Jones, chair/editor
Contributor
Subject
Genre
Language
eng
Member of
Cataloging source
SPIED
Dewey number
621.3815
Illustrations
illustrations
Index
no index present
Literary form
non fiction
Nature of contents
  • dictionaries
  • bibliography
http://library.link/vocab/relatedWorkOrContributorDate
1996
http://library.link/vocab/relatedWorkOrContributorName
  • Jones, Susan K
  • Society of Photo-optical Instrumentation Engineers
  • SPIE Digital Library
  • SPIE Conference on Metrology, Inspection, and Process Control for Microlithography
Series statement
Proceedings / SPIE--the International Society of Optical Engineering,
Series volume
2725
http://library.link/vocab/subjectName
  • Integrated circuits
  • Integrated circuits
  • Microlithography
Label
Metrology, inspection, and process control for microlithography X : 11-13 March, 1996, Santa Clara, California, sponsored and published by SPIE--the International Society for Optical Engineering ; Susan K. Jones, chair/editor, (electronic book)
Instantiates
Publication
Note
"This volume contains the original papers presented at the tenth annual SPIE Conference on Metrology, Inspection, and Process Control for Microlithography"--Introd
Bibliography note
Includes bibliographical references
Carrier category
online resource
Carrier category code
  • cr
Carrier MARC source
rdacarrier
Content category
text
Content type code
  • txt
Content type MARC source
rdacontent
Dimensions
28 cm.
Dimensions
unknown
Extent
xiii, 2725 p.
Form of item
electronic
Media category
computer
Media MARC source
rdamedia
Media type code
  • c
Other physical details
ill.
Reproduction note
Electronic resource.
Specific material designation
remote
Label
Metrology, inspection, and process control for microlithography X : 11-13 March, 1996, Santa Clara, California, sponsored and published by SPIE--the International Society for Optical Engineering ; Susan K. Jones, chair/editor, (electronic book)
Publication
Note
"This volume contains the original papers presented at the tenth annual SPIE Conference on Metrology, Inspection, and Process Control for Microlithography"--Introd
Bibliography note
Includes bibliographical references
Carrier category
online resource
Carrier category code
  • cr
Carrier MARC source
rdacarrier
Content category
text
Content type code
  • txt
Content type MARC source
rdacontent
Dimensions
28 cm.
Dimensions
unknown
Extent
xiii, 2725 p.
Form of item
electronic
Media category
computer
Media MARC source
rdamedia
Media type code
  • c
Other physical details
ill.
Reproduction note
Electronic resource.
Specific material designation
remote

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