The Resource Metrology, inspection, and process control for microlithography X : 11-13 March, 1996, Santa Clara, California, sponsored and published by SPIE--the International Society for Optical Engineering ; Susan K. Jones, chair/editor, (electronic book)

Metrology, inspection, and process control for microlithography X : 11-13 March, 1996, Santa Clara, California, sponsored and published by SPIE--the International Society for Optical Engineering ; Susan K. Jones, chair/editor, (electronic book)

Label
Metrology, inspection, and process control for microlithography X : 11-13 March, 1996, Santa Clara, California
Title
Metrology, inspection, and process control for microlithography X
Title remainder
11-13 March, 1996, Santa Clara, California
Statement of responsibility
sponsored and published by SPIE--the International Society for Optical Engineering ; Susan K. Jones, chair/editor
Contributor
Subject
Genre
Language
eng
Member of
Cataloging source
SPIED
Dewey number
621.3815
Illustrations
illustrations
Index
no index present
Literary form
non fiction
Nature of contents
  • dictionaries
  • bibliography
http://library.link/vocab/relatedWorkOrContributorDate
1996
http://library.link/vocab/relatedWorkOrContributorName
  • Jones, Susan K
  • Society of Photo-optical Instrumentation Engineers
  • SPIE Digital Library
  • SPIE Conference on Metrology, Inspection, and Process Control for Microlithography
Series statement
Proceedings / SPIE--the International Society of Optical Engineering,
Series volume
2725
http://library.link/vocab/subjectName
  • Integrated circuits
  • Integrated circuits
  • Microlithography
Label
Metrology, inspection, and process control for microlithography X : 11-13 March, 1996, Santa Clara, California, sponsored and published by SPIE--the International Society for Optical Engineering ; Susan K. Jones, chair/editor, (electronic book)
Instantiates
Publication
Note
"This volume contains the original papers presented at the tenth annual SPIE Conference on Metrology, Inspection, and Process Control for Microlithography"--Introd
Bibliography note
Includes bibliographical references
Dimensions
28 cm.
Dimensions
unknown
Extent
xiii, 2725 p.
Form of item
electronic
Other physical details
ill.
Reproduction note
Electronic resource.
Specific material designation
remote
Label
Metrology, inspection, and process control for microlithography X : 11-13 March, 1996, Santa Clara, California, sponsored and published by SPIE--the International Society for Optical Engineering ; Susan K. Jones, chair/editor, (electronic book)
Publication
Note
"This volume contains the original papers presented at the tenth annual SPIE Conference on Metrology, Inspection, and Process Control for Microlithography"--Introd
Bibliography note
Includes bibliographical references
Dimensions
28 cm.
Dimensions
unknown
Extent
xiii, 2725 p.
Form of item
electronic
Other physical details
ill.
Reproduction note
Electronic resource.
Specific material designation
remote

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