The Resource Metrology, inspection, and process control for microlithography XI : 10-12 March, 1997, Santa Clara, California, Susan K. Jones, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations SEMI--Semiconductor Equipment and Materials International, SEMATECH, (electronic book)
Metrology, inspection, and process control for microlithography XI : 10-12 March, 1997, Santa Clara, California, Susan K. Jones, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations SEMI--Semiconductor Equipment and Materials International, SEMATECH, (electronic book)
Resource Information
The item Metrology, inspection, and process control for microlithography XI : 10-12 March, 1997, Santa Clara, California, Susan K. Jones, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations SEMI--Semiconductor Equipment and Materials International, SEMATECH, (electronic book) represents a specific, individual, material embodiment of a distinct intellectual or artistic creation found in University of Liverpool.This item is available to borrow from 1 library branch.
Resource Information
The item Metrology, inspection, and process control for microlithography XI : 10-12 March, 1997, Santa Clara, California, Susan K. Jones, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations SEMI--Semiconductor Equipment and Materials International, SEMATECH, (electronic book) represents a specific, individual, material embodiment of a distinct intellectual or artistic creation found in University of Liverpool.
This item is available to borrow from 1 library branch.
- Label
- Metrology, inspection, and process control for microlithography XI : 10-12 March, 1997, Santa Clara, California
- Title
- Metrology, inspection, and process control for microlithography XI
- Title remainder
- 10-12 March, 1997, Santa Clara, California
- Statement of responsibility
- Susan K. Jones, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations SEMI--Semiconductor Equipment and Materials International, SEMATECH
- Language
- eng
- Cataloging source
- SPIED
- Dewey number
- 621.3815/31
- Illustrations
- illustrations
- Index
- index present
- LC call number
- TK7874
- LC item number
- .M4376 1997
- Literary form
- non fiction
- Nature of contents
-
- dictionaries
- bibliography
- http://library.link/vocab/relatedWorkOrContributorName
-
- Jones, Susan K
- Society of Photo-optical Instrumentation Engineers
- Semiconductor Equipment and Materials International
- SEMATECH (Organization)
- SPIE Digital Library
- Series statement
- Proceedings / SPIE--the International Society for Optical Engineering,
- Series volume
- 3050
- http://library.link/vocab/subjectName
-
- Integrated circuits
- Integrated circuits
- Microlithography
- Process control
- Label
- Metrology, inspection, and process control for microlithography XI : 10-12 March, 1997, Santa Clara, California, Susan K. Jones, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations SEMI--Semiconductor Equipment and Materials International, SEMATECH, (electronic book)
- Bibliography note
- Includes bibliographical references and author index
- Carrier category
- online resource
- Carrier category code
-
- cr
- Carrier MARC source
- rdacarrier
- Content category
- text
- Content type code
-
- txt
- Content type MARC source
- rdacontent
- Dimensions
- 28 cm.
- Dimensions
- unknown
- Extent
- x, 636 p.
- Form of item
- electronic
- Media category
- computer
- Media MARC source
- rdamedia
- Media type code
-
- c
- Other physical details
- ill.
- Reproduction note
- Electronic resource.
- Sound
- unknown sound
- Specific material designation
- remote
- Label
- Metrology, inspection, and process control for microlithography XI : 10-12 March, 1997, Santa Clara, California, Susan K. Jones, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations SEMI--Semiconductor Equipment and Materials International, SEMATECH, (electronic book)
- Bibliography note
- Includes bibliographical references and author index
- Carrier category
- online resource
- Carrier category code
-
- cr
- Carrier MARC source
- rdacarrier
- Content category
- text
- Content type code
-
- txt
- Content type MARC source
- rdacontent
- Dimensions
- 28 cm.
- Dimensions
- unknown
- Extent
- x, 636 p.
- Form of item
- electronic
- Media category
- computer
- Media MARC source
- rdamedia
- Media type code
-
- c
- Other physical details
- ill.
- Reproduction note
- Electronic resource.
- Sound
- unknown sound
- Specific material designation
- remote
Subject
- Integrated circuits -- Inspection -- Congresses
- Integrated circuits -- Measurement -- Congresses
- Microlithography -- Congresses
- Process control -- Congresses
Genre
Member of
- Proceedings of SPIE--the International Society for Optical Engineering, 3050
- Online access with subscription: SPIE digital library
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Data Citation of the Item Metrology, inspection, and process control for microlithography XI : 10-12 March, 1997, Santa Clara, California, Susan K. Jones, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations SEMI--Semiconductor Equipment and Materials International, SEMATECH, (electronic book)
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<div class="citation" vocab="http://schema.org/"><i class="fa fa-external-link-square fa-fw"></i> Data from <span resource="http://link.liverpool.ac.uk/portal/Metrology-inspection-and-process-control-for/qbO3v9gq4cc/" typeof="Book http://bibfra.me/vocab/lite/Item"><span property="name http://bibfra.me/vocab/lite/label"><a href="http://link.liverpool.ac.uk/portal/Metrology-inspection-and-process-control-for/qbO3v9gq4cc/">Metrology, inspection, and process control for microlithography XI : 10-12 March, 1997, Santa Clara, California, Susan K. Jones, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations SEMI--Semiconductor Equipment and Materials International, SEMATECH, (electronic book)</a></span> - <span property="potentialAction" typeOf="OrganizeAction"><span property="agent" typeof="LibrarySystem http://library.link/vocab/LibrarySystem" resource="http://link.liverpool.ac.uk/"><span property="name http://bibfra.me/vocab/lite/label"><a property="url" href="http://link.liverpool.ac.uk/">University of Liverpool</a></span></span></span></span></div>
