Coverart for item
The Resource Metrology, inspection, and process control for microlithography XXII : 25-28 February 2008, San Jose, California, USA, John A. Allgair, Christopher J. Raymond, editors ; sponsored and published by SPIE ; cooperating organization, SEMATECH (USA), (electronic book)

Metrology, inspection, and process control for microlithography XXII : 25-28 February 2008, San Jose, California, USA, John A. Allgair, Christopher J. Raymond, editors ; sponsored and published by SPIE ; cooperating organization, SEMATECH (USA), (electronic book)

Label
Metrology, inspection, and process control for microlithography XXII : 25-28 February 2008, San Jose, California, USA
Title
Metrology, inspection, and process control for microlithography XXII
Title remainder
25-28 February 2008, San Jose, California, USA
Statement of responsibility
John A. Allgair, Christopher J. Raymond, editors ; sponsored and published by SPIE ; cooperating organization, SEMATECH (USA)
Contributor
Subject
Genre
Language
eng
Member of
Cataloging source
STF
Illustrations
illustrations
Index
no index present
LC call number
TK7874
Literary form
non fiction
Nature of contents
  • dictionaries
  • bibliography
http://library.link/vocab/relatedWorkOrContributorName
  • Allgair, John A.
  • Raymond, Christopher J
  • SPIE (Society)
  • International SEMATECH
Series statement
Proceedings of SPIE,
Series volume
6922
http://library.link/vocab/subjectName
  • Integrated circuits
  • Integrated circuits
  • Microlithography
  • Process control
Label
Metrology, inspection, and process control for microlithography XXII : 25-28 February 2008, San Jose, California, USA, John A. Allgair, Christopher J. Raymond, editors ; sponsored and published by SPIE ; cooperating organization, SEMATECH (USA), (electronic book)
Instantiates
Publication
Bibliography note
Includes bibliographical references and author index
Carrier category
online resource
Carrier category code
  • cr
Carrier MARC source
rdacarrier
Color
mixed
Content category
text
Content type code
  • txt
Content type MARC source
rdacontent
Dimensions
28 cm.
Dimensions
unknown
Extent
2 v.
Form of item
electronic
Isbn
9780819471079
Media category
computer
Media MARC source
rdamedia
Media type code
  • c
Other physical details
ill.
Reproduction note
Electronic resource.
Specific material designation
remote
Label
Metrology, inspection, and process control for microlithography XXII : 25-28 February 2008, San Jose, California, USA, John A. Allgair, Christopher J. Raymond, editors ; sponsored and published by SPIE ; cooperating organization, SEMATECH (USA), (electronic book)
Publication
Bibliography note
Includes bibliographical references and author index
Carrier category
online resource
Carrier category code
  • cr
Carrier MARC source
rdacarrier
Color
mixed
Content category
text
Content type code
  • txt
Content type MARC source
rdacontent
Dimensions
28 cm.
Dimensions
unknown
Extent
2 v.
Form of item
electronic
Isbn
9780819471079
Media category
computer
Media MARC source
rdamedia
Media type code
  • c
Other physical details
ill.
Reproduction note
Electronic resource.
Specific material designation
remote

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