Coverart for item
The Resource Metrology, inspection, and process control for microlithography XXIII : 23-26 February 2009, San Jose, California, United States, John A. Allgair, Christopher J. Raymond, editors ; sponsored by SPIE ; cooperating organization, SEMATECH Inc. (United States)

Metrology, inspection, and process control for microlithography XXIII : 23-26 February 2009, San Jose, California, United States, John A. Allgair, Christopher J. Raymond, editors ; sponsored by SPIE ; cooperating organization, SEMATECH Inc. (United States)

Label
Metrology, inspection, and process control for microlithography XXIII : 23-26 February 2009, San Jose, California, United States
Title
Metrology, inspection, and process control for microlithography XXIII
Title remainder
23-26 February 2009, San Jose, California, United States
Statement of responsibility
John A. Allgair, Christopher J. Raymond, editors ; sponsored by SPIE ; cooperating organization, SEMATECH Inc. (United States)
Contributor
Subject
Genre
Language
eng
Member of
Additional physical form
Also available in print.
Cataloging source
NHM
http://bibfra.me/vocab/lite/collectionName
SPIE digital library
Dewey number
621.3815/48
Illustrations
illustrations
Index
no index present
LC call number
TK7874
LC item number
.I5554 2009e
Literary form
non fiction
Nature of contents
  • dictionaries
  • bibliography
http://library.link/vocab/relatedWorkOrContributorName
  • Allgair, John A.
  • Raymond, Christopher J.
  • SPIE (Society)
Series statement
Proceedings of SPIE,
Series volume
v. 7272
http://library.link/vocab/subjectName
  • Integrated circuits
  • Integrated circuits
  • Microlithography
  • Process control
Label
Metrology, inspection, and process control for microlithography XXIII : 23-26 February 2009, San Jose, California, United States, John A. Allgair, Christopher J. Raymond, editors ; sponsored by SPIE ; cooperating organization, SEMATECH Inc. (United States)
Instantiates
Publication
Note
  • Title from title screen (viewed Apr. 8, 2009)
  • Access restricted to SPIE Digital Library subscribers
Antecedent source
unknown
Bibliography note
Includes bibliographical references
Carrier category
online resource
Carrier category code
cr
Carrier MARC source
rdacarrier
Color
multicolored
Content category
text
Content type code
txt
Content type MARC source
rdacontent
Dimensions
unknown
Extent
1 electronic text (PDF)
File format
unknown
Form of item
online
Isbn
9780819475251
Level of compression
unknown
Media category
computer
Media MARC source
rdamedia
Media type code
c
Other physical details
illustrations (some color).
Quality assurance targets
unknown
Reformatting quality
unknown
Sound
unknown sound
Specific material designation
remote
System details
Mode of access: World Wide Web
Label
Metrology, inspection, and process control for microlithography XXIII : 23-26 February 2009, San Jose, California, United States, John A. Allgair, Christopher J. Raymond, editors ; sponsored by SPIE ; cooperating organization, SEMATECH Inc. (United States)
Publication
Note
  • Title from title screen (viewed Apr. 8, 2009)
  • Access restricted to SPIE Digital Library subscribers
Antecedent source
unknown
Bibliography note
Includes bibliographical references
Carrier category
online resource
Carrier category code
cr
Carrier MARC source
rdacarrier
Color
multicolored
Content category
text
Content type code
txt
Content type MARC source
rdacontent
Dimensions
unknown
Extent
1 electronic text (PDF)
File format
unknown
Form of item
online
Isbn
9780819475251
Level of compression
unknown
Media category
computer
Media MARC source
rdamedia
Media type code
c
Other physical details
illustrations (some color).
Quality assurance targets
unknown
Reformatting quality
unknown
Sound
unknown sound
Specific material designation
remote
System details
Mode of access: World Wide Web

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