The Resource Metrology, inspection, and process control for microlithography XIV : 28 February-2 March, 2000, Santa Clara, California, Neal T. Sullivan, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International ; International SEMATECH, (electronic book)

Metrology, inspection, and process control for microlithography XIV : 28 February-2 March, 2000, Santa Clara, California, Neal T. Sullivan, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International ; International SEMATECH, (electronic book)

Label
Metrology, inspection, and process control for microlithography XIV : 28 February-2 March, 2000, Santa Clara, California
Title
Metrology, inspection, and process control for microlithography XIV
Title remainder
28 February-2 March, 2000, Santa Clara, California
Statement of responsibility
Neal T. Sullivan, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International ; International SEMATECH
Contributor
Subject
Genre
Language
eng
Member of
Cataloging source
SPIED
Illustrations
illustrations
Index
index present
Literary form
non fiction
Nature of contents
  • dictionaries
  • bibliography
http://library.link/vocab/relatedWorkOrContributorName
  • Sullivan, Neal T
  • Society of Photo-optical Instrumentation Engineers
  • Semiconductor Equipment and Materials International
  • International SEMATECH
  • SPIE Digital Library
Series statement
SPIE proceedings series
Series volume
3998
http://library.link/vocab/subjectName
  • Integrated circuits
  • Integrated circuits
  • Microlithography
  • Process control
Label
Metrology, inspection, and process control for microlithography XIV : 28 February-2 March, 2000, Santa Clara, California, Neal T. Sullivan, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International ; International SEMATECH, (electronic book)
Instantiates
Publication
Bibliography note
Includes bibliographical references and author index
Carrier category
online resource
Carrier category code
  • cr
Carrier MARC source
rdacarrier
Content category
text
Content type code
  • txt
Content type MARC source
rdacontent
Dimensions
28 cm.
Dimensions
unknown
Extent
xiv, 938 p.
Form of item
electronic
Media category
computer
Media MARC source
rdamedia
Media type code
  • c
Other physical details
ill.
Reproduction note
Electronic resource.
Specific material designation
remote
Label
Metrology, inspection, and process control for microlithography XIV : 28 February-2 March, 2000, Santa Clara, California, Neal T. Sullivan, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International ; International SEMATECH, (electronic book)
Publication
Bibliography note
Includes bibliographical references and author index
Carrier category
online resource
Carrier category code
  • cr
Carrier MARC source
rdacarrier
Content category
text
Content type code
  • txt
Content type MARC source
rdacontent
Dimensions
28 cm.
Dimensions
unknown
Extent
xiv, 938 p.
Form of item
electronic
Media category
computer
Media MARC source
rdamedia
Media type code
  • c
Other physical details
ill.
Reproduction note
Electronic resource.
Specific material designation
remote

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