The Resource Microlithography and metrology in micromachining : 23-24 October, 1995, Austin, Texas, Michael T. Postek, chair/editor ; sponsored by SEMI--Semiconductor Equipment and Materials International, NIST--National Institute of Standards and Technology, SPIE--the International Society for Optical Engineering, (electronic book)

Microlithography and metrology in micromachining : 23-24 October, 1995, Austin, Texas, Michael T. Postek, chair/editor ; sponsored by SEMI--Semiconductor Equipment and Materials International, NIST--National Institute of Standards and Technology, SPIE--the International Society for Optical Engineering, (electronic book)

Label
Microlithography and metrology in micromachining : 23-24 October, 1995, Austin, Texas
Title
Microlithography and metrology in micromachining
Title remainder
23-24 October, 1995, Austin, Texas
Statement of responsibility
Michael T. Postek, chair/editor ; sponsored by SEMI--Semiconductor Equipment and Materials International, NIST--National Institute of Standards and Technology, SPIE--the International Society for Optical Engineering
Contributor
Subject
Genre
Language
eng
Member of
Cataloging source
SPIED
Dewey number
621.3815/2
Illustrations
illustrations
Index
index present
LC call number
TJ1191.5
LC item number
.M525 1995
Literary form
non fiction
Nature of contents
  • dictionaries
  • bibliography
http://library.link/vocab/relatedWorkOrContributorName
  • Postek, Michael T
  • Semiconductor Equipment and Materials Institute.
  • National Institute of Standards and Technology (U.S.)
  • Society of Photo-optical Instrumentation Engineers
  • SPIE Digital Library
Series statement
Proceedings / SPIE--the International Society for Optical Engineering,
Series volume
2640
http://library.link/vocab/subjectName
  • Micromachining
  • Microlithography
  • Mensuration
Label
Microlithography and metrology in micromachining : 23-24 October, 1995, Austin, Texas, Michael T. Postek, chair/editor ; sponsored by SEMI--Semiconductor Equipment and Materials International, NIST--National Institute of Standards and Technology, SPIE--the International Society for Optical Engineering, (electronic book)
Instantiates
Publication
Bibliography note
Includes bibliographical references and author index
Dimensions
28 cm.
Dimensions
unknown
Extent
ix, 246 p.
Form of item
electronic
Other physical details
ill.
Reproduction note
Electronic resource.
Specific material designation
remote
Label
Microlithography and metrology in micromachining : 23-24 October, 1995, Austin, Texas, Michael T. Postek, chair/editor ; sponsored by SEMI--Semiconductor Equipment and Materials International, NIST--National Institute of Standards and Technology, SPIE--the International Society for Optical Engineering, (electronic book)
Publication
Bibliography note
Includes bibliographical references and author index
Dimensions
28 cm.
Dimensions
unknown
Extent
ix, 246 p.
Form of item
electronic
Other physical details
ill.
Reproduction note
Electronic resource.
Specific material designation
remote

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