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The Resource Microscopy methods in nanomaterials characterization

Microscopy methods in nanomaterials characterization

Label
Microscopy methods in nanomaterials characterization
Title
Microscopy methods in nanomaterials characterization
Subject
Language
eng
Member of
Cataloging source
IDEBK
Dewey number
620.5
Index
no index present
LC call number
QC176.8.N35
Literary form
non fiction
Nature of contents
dictionaries
http://library.link/vocab/subjectName
  • Nanostructures
  • Nanostructured materials
  • Nanotechnology
  • Nanoscience
Label
Microscopy methods in nanomaterials characterization
Instantiates
Publication
Carrier category
online resource
Carrier category code
  • cr
Carrier MARC source
rdacarrier
Content category
text
Content type code
  • txt
Content type MARC source
rdacontent
Contents
  • Front Cover; Microscopy Methods in Nanomaterials Characterization; Microscopy Methods in Nanomaterials Characterization; Copyright; Contents; List of Contributors; Editor Biographies; 1 -- Scanning Electron Microscopy, ESEM, and X-ray Microanalysis; 1.1 INTRODUCTION; 1.2 SCANNING ELECTRON MICROSCOPY; 1.2.1 Principle; 1.2.2 Vacuum System; 1.2.3 Electron Beam Generation and Electron Optics; 1.2.3.1 Electron Beam Generation; 1.2.4 Signals, Detectors, and Image Formation; 1.2.5 Sample Preparation; 1.2.5.1 Mounting; 1.2.5.2 Fracture Surfaces; 1.2.5.3 Microtomed Sections and Cross Sections
  • 1.2.5.4 Target Preparation1.2.5.5 Focused Ion Beam; 1.2.5.6 Drying; 1.2.5.7 Conductive Coating; 1.2.6 Examples; 1.3 ENERGY DISPERSIVE X-RAY MICROANALYSIS; 1.3.1 Signal Generation and Detection; 1.3.2 Examples; 1.4 ENVIRONMENTAL SCANNING ELECTRON MICROSCOPY; 1.4.1 Principle and Advantages; 1.4.2 Instrumentation; 1.4.3 Examples; 1.5 CRYO SCANNING ELECTRON MICROSCOPY; 1.5.1 Instrumentation; 1.5.2 Examples; 1.6 LOW-VOLTAGE AND HIGH-RESOLUTION SCANNING ELECTRON MICROSCOPY; 1.6.1 Low-Voltage Scanning Electron Microscopy and Inlens Detectors; 1.6.2 Helium Ion Microscopy; REFERENCES
  • 2 -- Synthesis of Scanning Electron Microscopy Images of Nanostructures by High-Performance Monte Carlo Modeling2.1 INTRODUCTION; 2.2 MONTE CARLO MODELING OF SECONDARY-ELECTRON EMISSION AT LOW ENERGIES IN DIELECTRICS; 2.2.1 Elastic Scattering Cross Section; 2.2.2 Inelastic Cross Section; 2.2.2.1 Electron-Electron Interactions: Calculation of the Energy-Loss Function; 2.2.2.2 Electron-Phonon Scattering; 2.2.2.3 Polaron Trapping; 2.2.2.4 Quantum-Mechanical Surface Barrier Treatment; 2.2.3 The Monte Carlo Simulation Scheme; 2.2.3.1 Angle After an Elastic Scattering Event
  • 2.2.3.2 Angle and Energy Loss After an Electron-Electron Scattering Event2.2.3.3 Angle After an Electron-Phonon Scattering Event; 2.2.3.4 Transmission Through a Barrier; 2.3 EFFICIENT SIMULATION OF COMPLEX THREE-DIMENSIONAL GEOMETRIES; 2.3.1 The Silicon Box; 2.3.1.1 The Silicon Box: Basic Body; 2.3.1.2 The Silicon Box: Unstructured Grid and Voxelization; 2.3.2 Basic Fin Field Effect Transistor Structure; 2.3.3 Three-Dimensional Effects in a PMMA Mask at Nanometer Scale; 2.3.4 Parallel Computing in Sub-10 nm Structures; 2.4 METROLOGY OF NANOSTRUCTURES BY MONTE CARLO MODELING OF SEM IMAGES
  • 2.4.1 Metrics for Roughness2.4.2 Critical Dimension Extraction Techniques From SEM Line Scans; 2.4.2.1 Model-Based Library Approach; 2.4.2.2 Contour Technique; 2.4.3 Contact Hole With Line-Edge Roughness; 2.4.3.1 The Simulation Model; 2.4.3.2 CD Extraction by MBLA and by the Edge Contrast; 2.4.4 Polymethyl Methacrylate Patterns With LER; 2.4.4.1 Simulation Model and Parameters; 2.4.4.2 Critical Dimension Extraction by Model-Based Library Approach; 2.4.4.3 LER/LWR Analysis by the Model-Based Library Approach; 2.4.4.4 LER/LWR Analysis From Contour
Extent
1 online resource.
Form of item
online
Isbn
9780323461474
Media category
computer
Media MARC source
rdamedia
Media type code
  • c
Specific material designation
remote
Label
Microscopy methods in nanomaterials characterization
Publication
Carrier category
online resource
Carrier category code
  • cr
Carrier MARC source
rdacarrier
Content category
text
Content type code
  • txt
Content type MARC source
rdacontent
Contents
  • Front Cover; Microscopy Methods in Nanomaterials Characterization; Microscopy Methods in Nanomaterials Characterization; Copyright; Contents; List of Contributors; Editor Biographies; 1 -- Scanning Electron Microscopy, ESEM, and X-ray Microanalysis; 1.1 INTRODUCTION; 1.2 SCANNING ELECTRON MICROSCOPY; 1.2.1 Principle; 1.2.2 Vacuum System; 1.2.3 Electron Beam Generation and Electron Optics; 1.2.3.1 Electron Beam Generation; 1.2.4 Signals, Detectors, and Image Formation; 1.2.5 Sample Preparation; 1.2.5.1 Mounting; 1.2.5.2 Fracture Surfaces; 1.2.5.3 Microtomed Sections and Cross Sections
  • 1.2.5.4 Target Preparation1.2.5.5 Focused Ion Beam; 1.2.5.6 Drying; 1.2.5.7 Conductive Coating; 1.2.6 Examples; 1.3 ENERGY DISPERSIVE X-RAY MICROANALYSIS; 1.3.1 Signal Generation and Detection; 1.3.2 Examples; 1.4 ENVIRONMENTAL SCANNING ELECTRON MICROSCOPY; 1.4.1 Principle and Advantages; 1.4.2 Instrumentation; 1.4.3 Examples; 1.5 CRYO SCANNING ELECTRON MICROSCOPY; 1.5.1 Instrumentation; 1.5.2 Examples; 1.6 LOW-VOLTAGE AND HIGH-RESOLUTION SCANNING ELECTRON MICROSCOPY; 1.6.1 Low-Voltage Scanning Electron Microscopy and Inlens Detectors; 1.6.2 Helium Ion Microscopy; REFERENCES
  • 2 -- Synthesis of Scanning Electron Microscopy Images of Nanostructures by High-Performance Monte Carlo Modeling2.1 INTRODUCTION; 2.2 MONTE CARLO MODELING OF SECONDARY-ELECTRON EMISSION AT LOW ENERGIES IN DIELECTRICS; 2.2.1 Elastic Scattering Cross Section; 2.2.2 Inelastic Cross Section; 2.2.2.1 Electron-Electron Interactions: Calculation of the Energy-Loss Function; 2.2.2.2 Electron-Phonon Scattering; 2.2.2.3 Polaron Trapping; 2.2.2.4 Quantum-Mechanical Surface Barrier Treatment; 2.2.3 The Monte Carlo Simulation Scheme; 2.2.3.1 Angle After an Elastic Scattering Event
  • 2.2.3.2 Angle and Energy Loss After an Electron-Electron Scattering Event2.2.3.3 Angle After an Electron-Phonon Scattering Event; 2.2.3.4 Transmission Through a Barrier; 2.3 EFFICIENT SIMULATION OF COMPLEX THREE-DIMENSIONAL GEOMETRIES; 2.3.1 The Silicon Box; 2.3.1.1 The Silicon Box: Basic Body; 2.3.1.2 The Silicon Box: Unstructured Grid and Voxelization; 2.3.2 Basic Fin Field Effect Transistor Structure; 2.3.3 Three-Dimensional Effects in a PMMA Mask at Nanometer Scale; 2.3.4 Parallel Computing in Sub-10 nm Structures; 2.4 METROLOGY OF NANOSTRUCTURES BY MONTE CARLO MODELING OF SEM IMAGES
  • 2.4.1 Metrics for Roughness2.4.2 Critical Dimension Extraction Techniques From SEM Line Scans; 2.4.2.1 Model-Based Library Approach; 2.4.2.2 Contour Technique; 2.4.3 Contact Hole With Line-Edge Roughness; 2.4.3.1 The Simulation Model; 2.4.3.2 CD Extraction by MBLA and by the Edge Contrast; 2.4.4 Polymethyl Methacrylate Patterns With LER; 2.4.4.1 Simulation Model and Parameters; 2.4.4.2 Critical Dimension Extraction by Model-Based Library Approach; 2.4.4.3 LER/LWR Analysis by the Model-Based Library Approach; 2.4.4.4 LER/LWR Analysis From Contour
Extent
1 online resource.
Form of item
online
Isbn
9780323461474
Media category
computer
Media MARC source
rdamedia
Media type code
  • c
Specific material designation
remote

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