Coverart for item
The Resource Optical microlithography II : technology for the 1980s : March 16-17, 1983, Santa Clara, California, Harry L. Stover, chairman/editor ; sponsored by SPIE--the International Society for Optical Engineering, in cooperation with National Bureau of Standards, International Society for Hybrid Microelectronics, Northern California Microphotomask/Masking Working Group

Optical microlithography II : technology for the 1980s : March 16-17, 1983, Santa Clara, California, Harry L. Stover, chairman/editor ; sponsored by SPIE--the International Society for Optical Engineering, in cooperation with National Bureau of Standards, International Society for Hybrid Microelectronics, Northern California Microphotomask/Masking Working Group

Label
Optical microlithography II : technology for the 1980s : March 16-17, 1983, Santa Clara, California
Title
Optical microlithography II
Title remainder
technology for the 1980s : March 16-17, 1983, Santa Clara, California
Statement of responsibility
Harry L. Stover, chairman/editor ; sponsored by SPIE--the International Society for Optical Engineering, in cooperation with National Bureau of Standards, International Society for Hybrid Microelectronics, Northern California Microphotomask/Masking Working Group
Title variation
  • Optical microlithography 2
  • Optical microlithography two
Contributor
Subject
Genre
Language
eng
Member of
Cataloging source
COO
Dewey number
621.381/74
Illustrations
illustrations
Index
index present
LC call number
TR940
LC item number
.O68 1983
Literary form
non fiction
Nature of contents
  • dictionaries
  • bibliography
http://library.link/vocab/relatedWorkOrContributorName
  • Stover, Harry L.
  • Society of Photo-optical Instrumentation Engineers
Series statement
Proceedings of SPIE--the International Society for Optical Engineering
Series volume
v. 394
http://library.link/vocab/subjectName
  • Microlithography
  • Integrated circuits
Label
Optical microlithography II : technology for the 1980s : March 16-17, 1983, Santa Clara, California, Harry L. Stover, chairman/editor ; sponsored by SPIE--the International Society for Optical Engineering, in cooperation with National Bureau of Standards, International Society for Hybrid Microelectronics, Northern California Microphotomask/Masking Working Group
Instantiates
Publication
Bibliography note
Includes bibliographical references and index
Carrier category
online resource
Carrier category code
cr
Carrier MARC source
rdacarrier
Content category
text
Content type code
txt
Content type MARC source
rdacontent
Dimensions
unknown
Extent
1 online resource (vi, 251 pages)
Form of item
online
Isbn
9780892524297
Lccn
83050213
Media category
computer
Media MARC source
rdamedia
Media type code
c
Other physical details
illustrations.
Specific material designation
remote
Label
Optical microlithography II : technology for the 1980s : March 16-17, 1983, Santa Clara, California, Harry L. Stover, chairman/editor ; sponsored by SPIE--the International Society for Optical Engineering, in cooperation with National Bureau of Standards, International Society for Hybrid Microelectronics, Northern California Microphotomask/Masking Working Group
Publication
Bibliography note
Includes bibliographical references and index
Carrier category
online resource
Carrier category code
cr
Carrier MARC source
rdacarrier
Content category
text
Content type code
txt
Content type MARC source
rdacontent
Dimensions
unknown
Extent
1 online resource (vi, 251 pages)
Form of item
online
Isbn
9780892524297
Lccn
83050213
Media category
computer
Media MARC source
rdamedia
Media type code
c
Other physical details
illustrations.
Specific material designation
remote

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