The Resource Optical microlithography IX : 13-15 March, 1996, Santa Clara, California, Gene E. Fuller, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations SEMI--Semiconductor Equipment and Materials International, SEMATECH, (electronic book)

Optical microlithography IX : 13-15 March, 1996, Santa Clara, California, Gene E. Fuller, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations SEMI--Semiconductor Equipment and Materials International, SEMATECH, (electronic book)

Label
Optical microlithography IX : 13-15 March, 1996, Santa Clara, California
Title
Optical microlithography IX
Title remainder
13-15 March, 1996, Santa Clara, California
Statement of responsibility
Gene E. Fuller, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations SEMI--Semiconductor Equipment and Materials International, SEMATECH
Title variation
  • Optical microlithography 9
  • Optical microlithography nine
Contributor
Subject
Genre
Language
eng
Member of
Cataloging source
SPIED
Dewey number
621.3815/31
Illustrations
illustrations
Index
index present
Literary form
non fiction
Nature of contents
  • dictionaries
  • bibliography
http://library.link/vocab/relatedWorkOrContributorName
  • Fuller, Gene E
  • Society of Photo-optical Instrumentation Engineers
  • Semiconductor Equipment and Materials International.
  • SEMATECH (Organization)
  • SPIE Digital Library
Series statement
SPIE proceedings series,
Series volume
2726
http://library.link/vocab/subjectName
  • Microlithography
  • Integrated circuits
Label
Optical microlithography IX : 13-15 March, 1996, Santa Clara, California, Gene E. Fuller, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations SEMI--Semiconductor Equipment and Materials International, SEMATECH, (electronic book)
Instantiates
Publication
Bibliography note
Includes bibliographical references and index
Dimensions
28 cm.
Dimensions
unknown
Extent
2 v. (xii, 914 p.)
Form of item
electronic
Other physical details
ill.
Reproduction note
Electronic resource.
Specific material designation
remote
Label
Optical microlithography IX : 13-15 March, 1996, Santa Clara, California, Gene E. Fuller, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations SEMI--Semiconductor Equipment and Materials International, SEMATECH, (electronic book)
Publication
Bibliography note
Includes bibliographical references and index
Dimensions
28 cm.
Dimensions
unknown
Extent
2 v. (xii, 914 p.)
Form of item
electronic
Other physical details
ill.
Reproduction note
Electronic resource.
Specific material designation
remote

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