The Resource Optical microlithography XVII : 24-27 February 2004, Santa Clara, California, USA, Bruce W. Smith, chair/editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH, (electronic book)

Optical microlithography XVII : 24-27 February 2004, Santa Clara, California, USA, Bruce W. Smith, chair/editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH, (electronic book)

Label
Optical microlithography XVII : 24-27 February 2004, Santa Clara, California, USA
Title
Optical microlithography XVII
Title remainder
24-27 February 2004, Santa Clara, California, USA
Statement of responsibility
Bruce W. Smith, chair/editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH
Title variation
  • Optical microlithography 17
  • Optical microlithography seventeen
Contributor
Subject
Genre
Language
eng
Member of
Cataloging source
NHM
Illustrations
illustrations
Index
index present
Literary form
non fiction
Nature of contents
  • dictionaries
  • bibliography
http://library.link/vocab/relatedWorkOrContributorDate
1959-
http://library.link/vocab/relatedWorkOrContributorName
  • Smith, Bruce W.
  • Society of Photo-optical Instrumentation Engineers
  • Semiconductor Equipment and Materials International.
  • International SEMATECH.
  • SPIE Digital Library
Series statement
SPIE proceedings series
Series volume
5377
http://library.link/vocab/subjectName
  • Integrated circuits
  • Microlithography
  • X-ray lithography
  • Manufacturing processes
Label
Optical microlithography XVII : 24-27 February 2004, Santa Clara, California, USA, Bruce W. Smith, chair/editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH, (electronic book)
Instantiates
Publication
Bibliography note
Includes bibliographical references and index
Color
multicolored
Dimensions
28 cm.
Dimensions
unknown
Extent
3 v. (xxiii, 1314 p.)
Form of item
electronic
Other physical details
ill. (some col.)
Reproduction note
Electronic resource.
Specific material designation
remote
Label
Optical microlithography XVII : 24-27 February 2004, Santa Clara, California, USA, Bruce W. Smith, chair/editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH, (electronic book)
Publication
Bibliography note
Includes bibliographical references and index
Color
multicolored
Dimensions
28 cm.
Dimensions
unknown
Extent
3 v. (xxiii, 1314 p.)
Form of item
electronic
Other physical details
ill. (some col.)
Reproduction note
Electronic resource.
Specific material designation
remote

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