The Resource Optical microlithography XVII : 24-27 February 2004, Santa Clara, California, USA, Bruce W. Smith, chair/editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH, (electronic book)

Optical microlithography XVII : 24-27 February 2004, Santa Clara, California, USA, Bruce W. Smith, chair/editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH, (electronic book)

Label
Optical microlithography XVII : 24-27 February 2004, Santa Clara, California, USA
Title
Optical microlithography XVII
Title remainder
24-27 February 2004, Santa Clara, California, USA
Statement of responsibility
Bruce W. Smith, chair/editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH
Title variation
  • Optical microlithography 17
  • Optical microlithography seventeen
Contributor
Subject
Genre
Language
eng
Member of
Cataloging source
NHM
Illustrations
illustrations
Index
index present
LC call number
TR940
LC item number
.O696 2004
Literary form
non fiction
Nature of contents
  • dictionaries
  • bibliography
http://library.link/vocab/relatedWorkOrContributorDate
1959-
http://library.link/vocab/relatedWorkOrContributorName
  • Smith, Bruce W.
  • Society of Photo-optical Instrumentation Engineers
  • Semiconductor Equipment and Materials International
  • International SEMATECH
  • SPIE Digital Library
Series statement
SPIE proceedings series
Series volume
5377
http://library.link/vocab/subjectName
  • Integrated circuits
  • Microlithography
  • X-ray lithography
  • Manufacturing processes
Label
Optical microlithography XVII : 24-27 February 2004, Santa Clara, California, USA, Bruce W. Smith, chair/editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH, (electronic book)
Instantiates
Publication
Bibliography note
Includes bibliographical references and index
Carrier category
online resource
Carrier category code
  • cr
Carrier MARC source
rdacarrier
Color
multicolored
Content category
text
Content type code
  • txt
Content type MARC source
rdacontent
Dimensions
28 cm.
Dimensions
unknown
Extent
3 v. (xxiii, 1314 p.)
Form of item
electronic
Media category
computer
Media MARC source
rdamedia
Media type code
  • c
Other physical details
ill. (some col.)
Reproduction note
Electronic resource.
Specific material designation
remote
Label
Optical microlithography XVII : 24-27 February 2004, Santa Clara, California, USA, Bruce W. Smith, chair/editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH, (electronic book)
Publication
Bibliography note
Includes bibliographical references and index
Carrier category
online resource
Carrier category code
  • cr
Carrier MARC source
rdacarrier
Color
multicolored
Content category
text
Content type code
  • txt
Content type MARC source
rdacontent
Dimensions
28 cm.
Dimensions
unknown
Extent
3 v. (xxiii, 1314 p.)
Form of item
electronic
Media category
computer
Media MARC source
rdamedia
Media type code
  • c
Other physical details
ill. (some col.)
Reproduction note
Electronic resource.
Specific material designation
remote

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