The Resource Photomask and X-ray mask technology II : 20-21 April 1995, Kawasaki City, Kanagawa, Japan, Hideo Yoshihara, editor ; sponsored by Photomask Japan, BACUS, SPIE--the International Society for Optical Engineering ; cosponsored by Japan Chapter of SPIE ... [et al.], (electronic book)

Photomask and X-ray mask technology II : 20-21 April 1995, Kawasaki City, Kanagawa, Japan, Hideo Yoshihara, editor ; sponsored by Photomask Japan, BACUS, SPIE--the International Society for Optical Engineering ; cosponsored by Japan Chapter of SPIE ... [et al.], (electronic book)

Label
Photomask and X-ray mask technology II : 20-21 April 1995, Kawasaki City, Kanagawa, Japan
Title
Photomask and X-ray mask technology II
Title remainder
20-21 April 1995, Kawasaki City, Kanagawa, Japan
Statement of responsibility
Hideo Yoshihara, editor ; sponsored by Photomask Japan, BACUS, SPIE--the International Society for Optical Engineering ; cosponsored by Japan Chapter of SPIE ... [et al.]
Contributor
Subject
Genre
Language
eng
Member of
Cataloging source
SPIED
Dewey number
621.3815/31
Illustrations
illustrations
Index
index present
LC call number
TK7872.M3
LC item number
P47 1995
Literary form
non fiction
Nature of contents
  • dictionaries
  • bibliography
http://library.link/vocab/relatedWorkOrContributorName
  • Yoshihara, Hideo
  • Photomask Japan.
  • BACUS (Technical group)
  • Society of Photo-optical Instrumentation Engineers
  • SPIE Digital Library
Series statement
Proceedings / SPIE--the International Society for Optical Engineering,
Series volume
2512
http://library.link/vocab/subjectName
  • Integrated circuits
  • X-ray lithography
  • Microlithography
Label
Photomask and X-ray mask technology II : 20-21 April 1995, Kawasaki City, Kanagawa, Japan, Hideo Yoshihara, editor ; sponsored by Photomask Japan, BACUS, SPIE--the International Society for Optical Engineering ; cosponsored by Japan Chapter of SPIE ... [et al.], (electronic book)
Instantiates
Publication
Bibliography note
Includes bibliographical references and author index
Dimensions
28 cm.
Dimensions
unknown
Extent
xi, 554 p.
Form of item
electronic
Other physical details
ill.
Reproduction note
Electronic resource.
Specific material designation
remote
Label
Photomask and X-ray mask technology II : 20-21 April 1995, Kawasaki City, Kanagawa, Japan, Hideo Yoshihara, editor ; sponsored by Photomask Japan, BACUS, SPIE--the International Society for Optical Engineering ; cosponsored by Japan Chapter of SPIE ... [et al.], (electronic book)
Publication
Bibliography note
Includes bibliographical references and author index
Dimensions
28 cm.
Dimensions
unknown
Extent
xi, 554 p.
Form of item
electronic
Other physical details
ill.
Reproduction note
Electronic resource.
Specific material designation
remote

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